Analysis of the Influence of Deposition Conditions on the Structure of the Coating Nb-Al-N

Nanocomposite Nb-Al-N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1-Nb1 – xAlxNyO1 – y, and an amorphous like component related to aluminum oxynitride upon reactive magnetron sputtering. The substructure characteristics are sensitive to the current supplied to an Al target and related to the Knoop nanohardness and hardness, which change within in the ranges of 29-33.5 and 46-48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN / AlN heterostructures have been performed to interpret the obtained results for the first time

Analysis of the Influence of Deposition Conditions on the Structure of the Coating Nb-Al-N

Nanocomposite Nb-Al-N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1-Nb1 – xAlxNyO1 – y, and an amorphous like component related to aluminum oxynitride upon reactive magnetron sputtering. The substructure characteristics are sensitive to the current supplied to an Al target and related to the Knoop nanohardness and hardness, which change within in the ranges of 29-33.5 and 46-48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN / AlN heterostructures have been performed to interpret the obtained results for the first time

The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase

Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively

The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase

Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively

Structure and properties of nanocomposite Nb-Al-N films

Nanocomposite Nb–Al–N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1–Nb1 ⎯ xAlxNyO1 – y, and an amorphouslike component related to aluminum oxynitride upon reactive magnetron sputtering. It has been established that the substructure characteristics are sensitive to the current supplied to an Al target and are related to the Knoop nanohardness and hardness, which change in the ranges of 29–33.5 and 46–48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN/AlN heterostructures have been performed to interpret the obtained results for the first time.

Structure and properties of nanocomposite Nb-Al-N films

Nanocomposite Nb–Al–N films prepared by magnetron sputtering have been studied. It has been found that, in the films, there are two stable crystalline structural states, namely, NbNz and B1–Nb1 ⎯ xAlxNyO1 – y, and an amorphouslike component related to aluminum oxynitride upon reactive magnetron sputtering. It has been established that the substructure characteristics are sensitive to the current supplied to an Al target and are related to the Knoop nanohardness and hardness, which change in the ranges of 29–33.5 and 46–48 GPa, respectively. Ab initio calculations for the NbNz and Nb2AlN phases and NbN/AlN heterostructures have been performed to interpret the obtained results for the first time.

Recrystallization and Formation of Spheroidal Gold Particles in Amorphous-Like AlN–TiB2–TiSi2 Coatings after Annealing and Subsequent Implantation

The recrystallization of the structure of an X-ray amorphous AlN–TiB2–TiSi2 coating containing short-range order regions with characteristic sizes of 0.8–1.0 nm has been performed using a negative gold ion (Au–) beam and high-temperature annealing. Direct measurements using methods of high-resolution transmission electron microscopy (HRTEM) and energy-dispersive X-ray spectral (EDXS) microanalysis have demonstrated that thermal annealing at a temperature of 1300°C in air results in the formation of nanoscale (10–15 nm) phases AlN, AlB2, Al3O3, and TiO2, whereas the ion implantation of negative ions Au– leads to a fragmentation (decrease in the size) of nanograins to 2–5 nm with the formation of spheroidal gold nanocrystallites a few nanometers in size, as well as to the formation of an amorphous oxide film in the depth (near-surface layer) of the coating due to ballistic ion mixing and collision cascades

Исследование влияния параметров осаждения на структуру и физико-химические свойства защитных покрытий из Al2O3

Три серии образцов покрытий Al2O3 были получены методом микродугового оксидирования при различных условиях осаждения. Они были исследованы с помощью SEM-микроскопии с EDXS, RBS и рентгенофазового анализа XRD. Дефекты и поры в покрытии были исследованы методом позитронной аннигиляционной спектроскопии (PALS) при комнатной температуре, без вакуума. В процессе исследования не обнаружено образование нанометровых пор. Показано, что, меняя условия электролитно-плазменной обработки, можно изменять концентрацию и соотношение разного типа вакансионных дефектов в покрытии из Al2O3. При цитировании документа, используйте ссылку http://essuir.sumdu.edu.ua/handle/123456789/3392

Structural Features and Tribological Properties of Multilayer Coatings Based on Refractory Metals

A comparative analysis of the structural features and tribological properties of multilayer coatings based on refractory metal compounds has been conducted in this review. Features of formation of the elec- tronic structure of the synthesized coatings have been discussed, and the effect of methods and conditions of deposition on changes in the physicomechanical characteristics of nanocrystalline structures based on tran- sition metal nitrides has been shown. Dependences of antifriction properties, corrosion resistance, and ther- mal stability on the modulation period (Λ) and the number of bilayers in the studied multilayer coatings have been determined. A decrease in the modulation period of individual layers in a coating positively affects the oxidation resistance of the coating, while an increase in the number of interfaces between the layers slows down the diffusion of oxygen atoms deep into the coating and, thereby, increases the protective properties of the multilayer system as a whole. The effect of the droplet component in cathodic-arc coatings on corrosion development mechanisms in corrosive media has been shown. A class of multifunctional multilayer coatings with an adaptive friction mechanism, which is characterized by a change in the properties and structure during tribological tests, has been discussed separately

Microstructure and tribological properties of nitride coatings based on Zr, Ti, Cr, Nb, and Si elements

The structure and tribological properties of the nitride coatings (Zr–Ti–Nb)N, (Zr–Ti–Cr–Nb)N, and (Zr–Ti-Cr–Nb–Si)N, f abricated by vacuum arc deposition have been investigated. Their ele- mental composition and crystal structure are characterized by EDS and SEM analyses, XPS, and X-ray diffraction. The multicomponent (Zr–Ti–Cr–Nb–Si)N and (Zr–Ti–Nb)N coatings are f ound to be a simple f ace-centered cubic (f cc) solid solution. For the coatings without Si, the struc- ture is mainly composed of the TiN f cc phase and Cr2N trigonal modification. The (Zr–Ti–Nb)N and (Zr–Ti–Cr–Nb)N coatings provided the best adhesive strength in different conditions. The (Zr–Ti–Cr–Nb–Si)N coatings exhibited the worst adhesive strength, which may be attributed to the relative low hardness