Signal development and processing in multi wire proportional chambers

Radiation, Radionuclides and ReactorsApplied Science

Secondary electron emission materials for transmission dynodes in novel photomultipliers: A review

Secondary electron emission materials are reviewed with the aim of providing guidelines for the future development of novel transmission dynodes. Materials with reflection secondary electron yield higher than three and transmission secondary electron yield higher than one are tabulated for easy reference. Generations of transmission dynodes are listed in the order of the invention time with a special focus on the most recent atomic-layer-deposition synthesized transmission dynodes. Based on the knowledge gained from the survey of secondary election emission materials with high secondary electron yield, an outlook of possible improvements upon the state-of-the-art transmission dynodes is provided.Electronic Components, Technology and MaterialsRST/Neutron and Positron Methods in Material

Measurement of the transmission secondary electron yield of nanometer-thick films in a prototype Timed Photon Counter

We measure the transmission secondary electron yield of nanometer-thick Al2O3/TiN/Al2O3 films using a prototype version of a Timed Photon Counter (TiPC). We discuss the method to measure the yield extensively. The yield is then measured as a function of landing energy between 1.2 and 1.8 keV and found to be in the range of 0.1 (1.2 keV) to 0.9 (1.8 keV). These results are in agreement to data obtained by a different, independent method. We therefore conclude that the prototype TiPC is able to characterise the thin films in terms of transmission secondary electron yield. Additionally, observed features which are unrelated to the yield determination are interpreted.Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.ImPhys/Microscopy Instrumentation & TechniquesElectronic Components, Technology and Material

Ultra-thin alumina and silicon nitride MEMS fabricated membranes for the electron multiplication

In this paper we demonstrate the fabrication of large arrays of ultrathin freestanding membranes (tynodes) for application in a timed photon counter (TiPC), a novel photomultiplier for single electron detection. Low pressure chemical vapour deposited silicon nitride (Si x N y ) and atomic layer deposited alumina (Al2O3) with thicknesses down to only 5 nm are employed for the membrane fabrication. Detailed characterization of structural, mechanical and chemical properties of the utilized films is carried out for different process conditions and thicknesses. Furthermore, the performance of the tynodes is investigated in terms of secondary electron emission, a fundamental attribute that determines their applicability in TiPC. Studied features and presented fabrication methods may be of interest for other MEMS application of alumina and silicon nitride as well, in particular where strong ultra-thin membranes are required.Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.EKL-UsersElectronic Components, Technology and MaterialsRST/Neutron and Positron Methods in Material

Monte Carlo simulation of the secondary electron yield of silicon rich silicon nitride

The effect of doping in Si3N4 membranes on the secondary electron yield is investigated using Monte Carlo simulations of the electron-matter interactions. The effect of the concentration and the distribution of the doping in silicon rich silicon nitride membranes is studied by using the energy loss function as obtained from ab initio density functional theory calculations in the electron scattering models of the Monte Carlo simulations. An increasing doping concentration leads to a decreasing maximum secondary electron yield. The distribution of the doped silicon atoms can be optimised in order to minimize the decrease in yield.Green Open Access added to TU Delft Institutional Repository 'You share, we take care!' - Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.RST/Neutron and Positron Methods in MaterialsImPhys/Microscopy Instrumentation & Technique

The ultimate performance of the Rasnik 3-point alignment system

The Rasnik system is a 3-point optical displacement monitor with sub-nanometer precision. The CCD-Rasnik alignment system was developed in 1993 for monitoring the alignment of the muon chambers of the ATLAS Muon Spectrometer at CERN. Since then, the development has continued as new CMOS imaging pixel chips became available. In this work the system processes and parameters that limit the precision are studied. We conclude that the spatial resolution of Rasnik is only limited by the quantum fluctuations of the photon flux arriving at the pixels of the image sensor. The results of two Rasnik systems are compared to results from simulations, which are in good agreement. The best spatial resolution obtained was 7 pm/Hz. Finally, some applications of high-precision Rasnik systems are set out.ImPhys/Hoogenboom grou

Optimization of silicon-rich silicon nitride films for electron multiplication in timed photon counters

The excellent overall properties of silicon nitride, particularly its mechanical strength and resistance to many etchants, make it a widely used material for microsensors and microactuators. In this paper silicon-rich silicon nitride (SRN) films were investigated as material for ultra-thin transmission dynodes in electron multiplication. These dynodes are a fundamental element of ultrafast timed-photon counters (TiPC). The film properties were tuned to obtain SRN with higher conductivity so to suppress charging up effects, while maintaining or further reducing the low stress level required to fabricate the 20-50 nm thick dynodes. By optimizing low pressure chemical vapour deposition (LPCVD) process, SRN layers with very low compressive stress (± 10 MPa) and very low resistivity (± 1010 Ohm·m) are obtained.MicroelectronicsElectrical Engineering, Mathematics and Computer Scienc

Filtration Characterization Method as Tool to Assess Membrane Bioreactor Sludge Filterability—The Delft Experience

Prevention and removal of fouling is often the most energy intensive process in Membrane Bioreactors (MBRs), responsible for 40% to 50% of the total specific energy consumed in submerged MBRs. In the past decade, methods were developed to quantify and qualify fouling, aiming to support optimization in MBR operation. Therefore, there is a need for an evaluation of the lessons learned and how to proceed. In this article, five different methods for measuring MBR activated sludge filterability and critical flux are described, commented and evaluated. Both parameters characterize the fouling potential in full-scale MBRs. The article focuses on the Delft Filtration Characterization method (DFCm) as a convenient tool to characterize sludge properties, namely on data processing, accuracy, reproducibility, reliability, and applicability, defining the boundaries of the DFCm. Significant progress was made concerning fouling measurements in particular by using straight forward approaches focusing on the applicability of the obtained results. Nevertheless, a fouling measurement method is still to be defined which is capable of being unequivocal, concerning the fouling parameters definitions; practical and simple, in terms of set-up and operation; broad and useful, in terms of obtained results. A step forward would be the standardization of the aforementioned method to assess the sludge filtration quality.Water ManagementCivil Engineering and Geoscience

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

This study reports on the secondary electron emission (SEE) performance of atomic layer deposited MgO films, with thicknesses in the range from 5 to 25 nm, for the application in the Timed Photon Counter. In this novel, photodetector MgO is utilized as a material for the fabrication of ultrathin transmission dynodes (tynodes). Two different types of PECVD silicon oxide films are applied on top of MgO, in order to protect it against etching steps in the fabrication of tynodes and also as a prevention against aging. Applicability of these two materials as capping films is evaluated in terms of achieved secondary electron yield (SEY) of MgO after their removal. Emission of secondary electrons is known to depend on numerous physical and chemical properties of the material, such as surface roughness and chemical composition. On that account, morphological and structural properties of modified MgO are determined by atomic force microscope and x-ray photoelectron spectrometer and linked to the changes in SEE behavior. The authors demonstrate that the application of a suitable capping layer followed by its removal provides an SEY of 6.6, as opposed to the value of 4.8 recorded from the as-deposited MgO film. Furthermore, in a following experiment, they showed that annealing of MgO films at high temperatures (up to 1100 °C) significantly improved the secondary electron emission, elevating the SEY to 7.2.Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.EKL ProcessingElectronic Components, Technology and Material

Landscape Architecture at TU Delft 1973-2011: Ter gelegenheid afscheid Prof. Dr. Clemens Steenbergen

Het is haast onmogelijk om de werkzame jaren van Prof. Dr. Clemens Steenbergen hier op de TU Delft in het kort samen te vatten. Dit is een persoonlijk boek van collega's, medewerkers en studenten ter gelegenheid van zijn afscheid op 15. December 2011.UrbanismArchitectur