Genome-wide association analysis identifies resistance loci for bacterial blight in a diverse collection of indica rice germplasm

Bacterial blight, which is caused by Xanthomonas oryzae pv. oryzae (Xoo), is one of the most devastating rice diseases worldwide. The development and use of disease-resistant cultivars have been the most effective strategy to control bacterial blight. Identifying the genes mediating bacterial blight resistance is a prerequisite for breeding cultivars with broad-spectrum and durable resistance. We herein describe a genome-wide association study involving 172 diverse Oryza sativa ssp. indica accessions to identify loci influencing the resistance to representative strains of six Xoo races. Twelve resistance loci containing 121 significantly associated signals were identified using 317,894 single nucleotide polymorphisms, which explained 13.3–59.9% of the variability in lesion length caused by Xoo races P1, P6, and P9a. Two hotspot regions (L11 and L12) were located within or nearby two cloned R genes (xa25 and Xa26) and one fine-mapped R gene (Xa4). Our results confirmed the relatively high resolution of genome-wide association studies. Moreover, we detected novel significant associations on chromosomes 2, 3, and 6–10. Haplotype analyses of xa25, the Xa26 paralog (MRKc; LOC_Os11g47290), and a Xa4 candidate gene (LOC_11g46870) revealed differences in bacterial blight resistance among indica subgroups. These differences were responsible for the observed variations in lesion lengths resulting from infections by Xoo races P1 and P9a. Our findings may be relevant for future studies involving bacterial blight resistance gene cloning, and provide insights into the genetic basis for bacterial blight resistance in indica rice, which may be useful for knowledge-based crop improvement. (Résumé d'auteur

Understanding the e+e−→D(∗)+D(∗)−e^+e^-\to D^{(*)+}D^{(*)-} processes observed by Belle

We calculate the production cross sections for $D^{*+}D^{*-}$, $D^+D^{*-}$ and $D^+D^-$ in $e^+e^-$ annihilation through one virtual photon in the framework of perturbative QCD with constituent quarks. The calculated cross sections for $D^{*+}D^{*-}$ and $D^+D^{*-}$ production are roughly in agreement with the recent Belle data. The helicity decomposition for $D^{*}$ meson production is also calculated. The fraction of the $D^{*\pm}_LD^{*\mp}_T$ final state in $e^+e^-\to D^{*+}D^{*-}$ process is found to be 65%. The fraction of $DD^*_T$ production is 100% and $DD^*_L$ is forbidden in $e^+e^-$ annihilation through one virtual photon. We further consider $e^+e^-$ annihilation through two virtual photons, and then find the fraction of $DD^{*}_T$ in $e^+e^-\to DD^{*}$ process to be about 91%.Comment: 8 pages, 2 figure

4-(4-Hydroxy­phenyl­diazen­yl)­benzonitrile

The molecule of the title compound, C13H9N3O, is achiral but forms a chiral arrangement in the crystal structure. The mol­ecule adopts an E configuration with respect to the N=N bond and is almost planar, with an r.m.s. deviation of 0.0439 Å from the plane through all atoms in the mol­ecule. The dihedral angle between the two benzene rings is 2.2 (2)°. In the crystal structure, inter­molecular O—H⋯N hydrogen bonding generates a chain