Application of Pad\'{e} interpolation to stationary state problems

If the small and large coupling behavior of a physical system can be computed perturbatively and expressed respectively as power series in a coupling parameter $g$ and $1/g$, a Pad\'{e} approximant embracing the two series can interpolate between these two limits and provide an accurate estimate of the system's behavior in the generally intractable intermediate coupling regime. The methodology and validity of this approach are illustrated by considering several stationary state problems in quantum mechanics.Comment: RevTeX4, 7 pages (including 7 tables); v4 typos correcte

Pion Interferometry for Hydrodynamical Expanding Source with a Finite Baryon Density

We calculate the two-pion correlation function for an expanding hadron source with a finite baryon density. The space-time evolution of the source is described by relativistic hydrodynamics and the Hanbury-Brown-Twiss (HBT) radius is extracted after effects of collective expansion and multiple scattering on the HBT interferometry have been taken into account, using quantum probability amplitudes in a path-integral formalism. We find that this radius is substantially smaller than the HBT radius extracted from the freeze-out configuration.Comment: 4 pages, 2 figure

Piecewise-polynomial associated transform macromodeling algorithm for fast nonlinear circuit simulation

We present a piecewise-polynomial based associated transform algorithm (PWPAT) for macromodeling nonlinear circuits in system-level circuit design. The generated reduced model can provide both global and local accuracies with the most compact dimension. Numerical examples compare it with existing algorithms and verify its superior accuracy in higher order harmonics simulation over traditional Trajectory Piecewise-Linear (TPWL) approach. © 2013 IEEE.published_or_final_versio

Pion Interferometry for a Granular Source of Quark-Gluon Plasma Droplets

We examine the two-pion interferometry for a granular source of quark-gluon plasma droplets. The evolution of the droplets is described by relativistic hydrodynamics with an equation of state suggested by lattice gauge results. Pions are assumed to be emitted thermally from the droplets at the freeze-out configuration characterized by a freeze-out temperature $T_f$. We find that the HBT radius $R_{out}$ decreases if the initial size of the droplets decreases. On the other hand, $R_{side}$ depends on the droplet spatial distribution and is relatively independent of the droplet size. It increases with an increase in the width of the spatial distribution and the collective-expansion velocity of the droplets. As a result, the value of $R_{out}$ can lie close to $R_{side}$ for a granular quark-gluon plasma source. The granular model of the emitting source may provide an explanation to the RHIC HBT puzzle and may lead to a new insight into the dynamics of the quark-gluon plasma phase transition.Comment: 5 pages, 4 figure

Baryon deceleration by strong chromofields in ultrarelativistic nuclear collisions

It is assumed that strong chromofields are generated at early stages of ultrarelativistic heavy-ion collisions which give rise to a collective deceleration of net baryons from colliding nuclei. We have solved classical equations of motion for baryonic slabs under the action of a time-dependent longitudinal chromoelectric field. It is demonstrated that the slab final rapidities are rather sensitive to the strength and decay time of the chromofield as well as to the back reaction of the produced partonic plasma. The net-baryon rapidity loss of about 2 units, found for most central Au-Au collisions at RHIC, can be explained by the action of chromofields with the initial energy density of about 50 GeV/fm^3. Predictions for the baryon stopping at the LHC are made.Comment: 10 pages in revtex, 3 eps figure

Robust level-set-based inverse lithography

Level-set based inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem, interpreted with a time-dependent model, and then solved as a partial differential equation with finite difference schemes. This paper focuses on developing level-set based ILT for partially coherent systems, and upon that an expectation-orient optimization framework weighting the cost function by random process condition variables. These include defocus and aberration to enhance robustness of layout patterns against process variations. Results demonstrating the benefits of defocus-aberration-aware level-set based ILT are presented. © 2011 Optical Society of America.published_or_final_versio

Design of CRLH millimeter-wave passive filters in standard CMOS process

A novel approach to design millimeter-wave passive filters is presented using composite right/left-handed (CRLH) structures in a standard CMOS process. The filter is composed of left-handed open split-ring resonators (OSRR) or open complementary split-ring resonators (OCSRR). Such approach leads to a significant reduction in the on-chip area of the filter. It is also straightforward to construct similar filters based on the resonators' equivalent circuit models. ©2009 IEEE.published_or_final_versionThe IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC 2009), Xian, China, 25-27 November 2009. In Proceedings of the IEEE International Conference on Electron Devices and Solid-State Circuits, 2009, p. 1-

Aberration-aware robust mask design with level-set-based inverse lithography

Optical proximity correction (OPC) is one of the most widely used Resolution Enhancement Techniques (RET) in mask designs. Conventional OPC is often designed for a set of nominal imaging parameters without giving sufficient attention to the process variations caused by aspherical wavefront leaving the exit pupil of the lithography system. As a result, the mask designed may deliver poor performance with process variations. In this paper, we first describe how a general point spread function (PSF) with wave aberration can degrade the output pattern quality, and then show how the wave aberration function can be incorporated into an inverse imaging framework for robust input mask pattern design against aberrations. A level-set-based time-dependent model can then be applied to solve it with appropriate finite difference schemes. The optimal mask gives more robust performance against either one specific type of aberration or a combination of different types of aberrations. © 2010 SPIE.published_or_final_versionThe Photomask and Next-Generation Lithography Mask Technology XVII, Yokohama, Japan, 13-14 April 2010. in Proceedings of SPIE, 2010, v. 7748, article no. 77481U, p. 1-