Influence of the Oxygen Plasma Treatment on Carbon Electrode and Capacity of Supercapacitors

Amorphous carbon electrodes were deposited using atmospheric pressure plasma torch from the mixture of argon and acetylene gases on the stainless steel substrates. The ratio of Ar/$C_2H_2$ was in the range of 15-55. The deposited coatings were immersed in low pressure oxygen plasma for 1 min. Scanning electron microscopy images show that when Ar/$C_2H_2$ ratio increases from 15 to 55, the electrodes surface roughness decreases. The Raman scattering spectroscopy results indicated that the $I_{D}$/$I_{G}$ ratio decreases from 2.04 to 1.35. It was observed that with the increase of Ar/$C_2H_2$ ratio from 15 to 55, the capacity of supercapacitor increases from 16 mF to 36 mF. The electric capacity of capacitors has increased up to 7 times after their exposure in oxygen plasma

Deposition of Amorphous Hydrogenated Carbon Coatings by Plasma Jet

In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an $Ar-C_2H_2$ and $Ar-C_2H_2-H_2$ gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the $Ar:C_2H_2$ ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled