Anesthetic management of a patient with a double inferior vena cava and pulmonary alveolar proteinosis who underwent bilateral living-donor lobar lung transplantation.

A 43-year-old woman with pulmonary fibrosis secondary to pulmonary alveolar proteinosis was scheduled to undergo lung transplantation. Before the lung transplantation, she had undergone multiple whole-lung lavage procedures on extracorporeal circulation (ECC), which had caused scarring of the right femoral subcutaneous tissues. Preoperative examination revealed a double inferior vena cava (IVC) with interiliac communication, and the left IVC ended at the left renal vein. Surgical exposure of the right femoral vessels was performed immediately after anesthetic induction for emergent vascular access to establish an ECC. Cardiopulmonary collapse did not occur and the ECC was not required until lung resection. The lung transplantation was completed uneventfully. Congenital IVC anomaly is rare, but may make cannulation through the femoral vein difficult. Scarring of the subcutaneous tissue could result in a difficult "percutaneous" approach to the vessels. Evaluation of the vascular anatomy related to the establishment of an ECC is important before lung transplantation

Nanoscale rings fabricated using self-assembled triblock terpolymer templates

Although there has been extensive work on the use of self-assembled diblock copolymers for nanolithography, there are few reports of the use of multiblock copolymers, which can form a more diverse range of nanoscale pattern geometries. Pattern transfer from a self-assembled poly(butadiene-b-styrene-b-methyl methacrylate) (PB-b-PS-b-PMMA) triblock terpolymer thin film has been investigated. Polymers of different total molecular weight were synthesized with a predicted morphology consisting of PMMA-core/PS-shell cylinders in a PB matrix. By adjusting the solvent-annealing conditions and the film thickness, thin films with vertically oriented cylinders were formed. The PMMA cylinder cores and the PB matrix were then removed using selective etching to leave an array of PS rings, and the ring pattern was transferred into a silica film by reactive ion etching to form 19 nm high silica rings. This result illustrates the design and use of triblock terpolymers for self-assembled lithography. © 2008 American Chemical Society

Si-containing block copolymers for self-assembled nanolithography\ud

Block copolymers can self-assemble to generate patterns with nanoscale periodicity, which may be useful in lithographic applications. Block copolymers in which one block is organic and the other contains Si are appealing for self-assembled lithography because of the high etch contrast between the blocks, the high etch resistance of the Si-containing block, and the high Flory–Huggins interaction parameter, which is expected to minimize line edge roughness. The locations and long range order of the microdomains can be controlled using shallow topographical features. Pattern generation from poly(styrene)-poly(ferrocenyldimethylsilane) and poly(styrene)-poly(dimethylsiloxane) block copolymers, and the subsequent pattern transfer into metal, oxide, and polymer films, is describe