ЗАВИСИМОСТЬ ДЕФОРМАЦИОННОГО СОСТОЯНИЯ ПЛЕНОК GaAs НА ВИЦИНАЛЬНЫХ ПОДЛОЖКАХ Si(001) ОТ СПОСОБА ФОРМИРОВАНИЯ ПЕРВЫХ МОНОСЛОЕВ ПРОСЛОЙКИ GaP

A significant dependence of the strain state of GaAs film lattice grown by molecular−beam epitaxy (MBE) on the nucleation method of early GaP buffer layers (50 nm) on the vicinal substrate Si(001) 4° around the <011> axis was discovered. GaP growth started layer−by−layer with a gallium or a phosphorus sublayer. If GaP nucleated with a gallium sublayer, the GaAs film has a significant lattice rotation around the <011> axis. If the buffer starts forming with a phosphorus layer the GaAs film evidently rotates around the <001> axis. The film relaxation degree ex- ceeds 100%, and the film is in a laterally strained state. Analysis was carried out using the triclinic distortion model. A reciprocal space scattering map was obtained using X−ray diffraction in a three−axis low resolution setup. The map clearly shows that the GaAs film lattice is rotated.Выявлена существенная зависимость деформационного состояния кристаллической решетки пленок GaAs, выращенных методом молекулярнолучевой эпитаксии от способа зарождения первых слоев прослойки GaP (50 нм) на вицинальной подложке Si(001) 4° вокруг оси <011>. Рост GaP начинался послойно с галлиевого или фосфорного подслоя. Установлено, что в случае зарождения GaP с галлия, пленка GaAs имеет значительный поворот кристаллической решетки вокруг направления <011>. При фор- мировании прослойки с фосфорного подслоя заметен поворот пленки GaAs вокруг <001>. Степень релаксации пленки составляет более 100 %, она находится в латерально растянутом состоянии. Анализ проведен с использованием модели триклинных искажений. Представлена карта рассеяния в обратном пространстве, полученная с помощью рентгеновской дифрактометрии в трехосевой схеме малого разрешения. На карте явно виден факт поворота кристаллической решетки пленки GaAs.

Synthesis of epitaxial films based on Ge-Si-Sn materials with Ge/GeSn, Ge/GeSiSn, and GeSn/GeSiSn heterojunctions

Results of investigations into the synthesis of heterostructures based on Ge–Si–Sn materials by the method of low-temperature molecular beam epitaxy are presented. The formation of epitaxial films during structure growth has been controlled by the reflection high-energy electron diffraction method. Films with Ge/GeSn, Ge/GeSiSn, and GeSn/GeSiSn heterojunctions are grown with Sn content changing from 2 to 10 % at temperatures in the interval 150–350°С. The stressed state, the composition, and the lattice parameter are studied by the x-ray diffraction method using Omega-scan curves and reciprocal space maps. A tensile strain in the Ge film during Ge/Ge0.9Sn0.1/Si structure growth has reached 0.86%

Synthesis of epitaxial films based on Ge-Si-Sn materials with Ge/GeSn, Ge/GeSiSn, and GeSn/GeSiSn heterojunctions

Results of investigations into the synthesis of heterostructures based on Ge–Si–Sn materials by the method of low-temperature molecular beam epitaxy are presented. The formation of epitaxial films during structure growth has been controlled by the reflection high-energy electron diffraction method. Films with Ge/GeSn, Ge/GeSiSn, and GeSn/GeSiSn heterojunctions are grown with Sn content changing from 2 to 10 % at temperatures in the interval 150–350°С. The stressed state, the composition, and the lattice parameter are studied by the x-ray diffraction method using Omega-scan curves and reciprocal space maps. A tensile strain in the Ge film during Ge/Ge0.9Sn0.1/Si structure growth has reached 0.86%

Growth of epitaxial SiSn films with high Sn content for IR converters

Growth of SiSn compounds with a Sn content from 10 to 35% is studied. The morphology and surface structure of the SiSn layers are examined and the kinetic diagram of the morphological state of SiSn films is established in the temperature range of 150–450°C. During the growth of SiSn films from 150 to 300°C, oscillations of specular beam were observed. For the first time, periodic multilayer SiSn/Si structures with pseudomorphic monocrystalline SiSn layers with the Sn content from 10 to 25% are grown. The c(8×4) and (5×1) superstructures are identified during the growth of Si on the SiSn layer and the conditions are determined for the formation of the desired Si surface structure by controlling the growth temperature. From the diffraction reflection curves, the lattice parameter, the SiSn composition, and the period in the multilayer periodic structure are defined, which with high precision correspond to the specified values

Growth of epitaxial SiSn films with high Sn content for IR converters

Growth of SiSn compounds with a Sn content from 10 to 35% is studied. The morphology and surface structure of the SiSn layers are examined and the kinetic diagram of the morphological state of SiSn films is established in the temperature range of 150–450°C. During the growth of SiSn films from 150 to 300°C, oscillations of specular beam were observed. For the first time, periodic multilayer SiSn/Si structures with pseudomorphic monocrystalline SiSn layers with the Sn content from 10 to 25% are grown. The c(8×4) and (5×1) superstructures are identified during the growth of Si on the SiSn layer and the conditions are determined for the formation of the desired Si surface structure by controlling the growth temperature. From the diffraction reflection curves, the lattice parameter, the SiSn composition, and the period in the multilayer periodic structure are defined, which with high precision correspond to the specified values