45 research outputs found

    Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

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    Session: Novel Computational Imaging (CW1B)This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF. © 2017 OS
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