353 research outputs found
Differing instructional needs for children of similar reading achievement grades two, four, and six
Thesis (Ed.M.)--Boston Universit
The Nexum: A Modest Proposal for Self-Guardianship by Contract: A System of Advance Directives and Surrogate Committees-at-Large for the Intermittently Mentally Ill
Letter to the Editor Concerning Simultaneous, Single-Particle Measurements of Size and Loading Give Insights into the Structure of Drug-Delivery Nanoparticles
The vexing error of excess variance in the sizing of single particles
degrades accuracy in applications ranging from quality control of nanoparticle
products to hazard assessment of nanoplastic byproducts. The particular
importance of lipid nanoparticles for vaccine and medicine delivery motivates
this comment on a publication in ACS Nano. In ref 1, the
benchmark measurements of a nanoparticle standard manifest large errors of the
size distribution that contradict the claim of validation. Such errors can bias
the correlation of fluorescence intensity as an optical proxy for the molecular
loading of lipid nanoparticles and give misleading insights from power-law
models of intensitysize data. Looking forward, measurement error models have
the potential to address this widespread issue.Comment: Peer reviewed and pending acceptance by ACS Nan
Subnanometer traceability of localization microscopy
In localization microscopy, subnanometer precision is possible but supporting
accuracy is challenging, and no study has demonstrated reliable traceability to
the International System of Units (SI). To do so, we measure the positions of
nanoscale apertures in a reference array by traceable atomic-force microscopy,
creating a master standard. We perform correlative measurements of this
standard by optical microscopy, correcting position errors from optical
aberrations by a Zernike calibration. We establish an uncertainty field due to
localization errors and scale uncertainty, with regions of position
traceability to within a 68 % coverage interval of +/- 1.0 nm. These results
enable localization metrology with high throughput, which we apply to measure
working standards, validating the subnanometer accuracy of lithographic pitch
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