Subnanometer traceability of localization microscopy

Abstract

In localization microscopy, subnanometer precision is possible but supporting accuracy is challenging, and no study has demonstrated reliable traceability to the International System of Units (SI). To do so, we measure the positions of nanoscale apertures in a reference array by traceable atomic-force microscopy, creating a master standard. We perform correlative measurements of this standard by optical microscopy, correcting position errors from optical aberrations by a Zernike calibration. We establish an uncertainty field due to localization errors and scale uncertainty, with regions of position traceability to within a 68 % coverage interval of +/- 1.0 nm. These results enable localization metrology with high throughput, which we apply to measure working standards, validating the subnanometer accuracy of lithographic pitch