Processing and analysis of long-range scans with an atomic force microscope (AFM) in combination with nanopositioning and nanomeasuring technology for defect detection and quality control

This paper deals with a planar nanopositioning and -measuring machine, the so-called nanofabrication machine (NFM-100), in combination with a mounted atomic force microscope (AFM). This planar machine has a circular moving range of 100 mm. Due to the possibility of detecting structures in the nanometre range with an atomic force microscope and the large range of motion of the NFM-100, structures can be analysed with high resolution and precision over large areas by combining the two systems, which was not possible before. On the basis of a grating sample, line scans over lengths in the millimetre range are demonstrated on the one hand; on the other hand, the accuracy as well as various evaluation methods are discussed and analysed

Untersuchungen zur Positioniergenauigkeit der NanoFabrikationsmaschine (NFM-100)

Dieser Beitrag beschäftigt sich mit der Analyse der Positioniergenauigkeit einer neuen Nano-Fabrikationsmaschine. Diese Maschine verwendet ein planares Direktantriebssystem und hat einen Positionierbereich von 100 mm im Durchmesser. Die Positioniergenauigkeit wurde in verschiedenen Bewegungsszenarien untersucht, einschließlich Phasen der Beschleunigung und Abbremsung. Auch die Positionsabweichung bestimmter Bewegungen wird bei unterschiedlichen Positionen des Maschinentisches betrachtet. Derzeit ist die NFM-100 mit einem spitzenbasierten Messsystem ausgestattet. Dieses Rasterkraftmikroskop (AFM) verwendet aktive Mikroantilever, die auch für die Field-Emission-Scanning-Probe-Lithographie (FESPL) geeignet sind. Dieses Verfahren ist in der Lage, Strukturen im Nanometer-Bereich herzustellen. In Kombination mit der NFM-100 und ihrem Positionierbereich können Nanostrukturen im makroskopischen Bereich analysiert und geschrieben werden, ohne jeglichen Werkzeugwechsel. Der Schwerpunkt in diesem Artikel liegt jedoch auf der Mess- und Positioniergenauigkeit des spitzenbasierten Messsystems in Kombination mit der NFM-100 und wird durch wiederholte Messungen verifiziert. Abschließend wird ein Linienscan, der mit beiden Systemen realisiert wurde, über einen großen Bewegungsbereich von 30 mm gezeigt.This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm

Silicon carbide - graphene nano-gratings on 4H and 6H semi-insulating SiC

A technical methodology of fabrication of hierarchically scaled multitude graphene nanogratings with varying pitches ranging from the micrometer down to sub 40 nm scale combined with sub 10 nm step heights on 4H and 6H semi-insulating SiC for length scale measurements is proposed. The nanogratings were fabricated using electron-beam lithography combined with dry etching of graphene, incorporating a standard semiconductor processing technology. A scientific evaluation of critical dimension, etching step heights, and surface characterization of graphene nanograting on both polytypes were compared and evaluated

Measurement precision of a planar nanopositioning machine with a range of motion of Ø100 mm

This work deals with various investigations into the accuracy of a newly developed planar nanopositioning machine. This machine, called Nanofabrication Machine 100 (NFM-100), has a positioning range of 100 mm in diameter. To determine the precision, various movement scenarios are performed with the machine table, and the trajectory deviation from the set trajectory is determined. In particular, the focus is on high velocities of up to 20 mm/s. Even at high speeds in the range of several millimetres per second, this machine can impress with its performance and only has a deviation in the nanometre range

Determination of the mixing ratio of a flowing gas mixture with self-actuated microcantilevers

Microcantilevers offer a wide range of applications in sensor and measurement technology. In this work cantilever sensors are used as flow sensors. Most conventional flow sensors are often only calibrated for one type of gas and allow an analysis of gas mixtures only with increased effort. The sensor used here is a cantilever positioned vertically in the flow channel. It is possible to operate the sensor in dynamic and static mode. In the dynamic mode the cantilever is oscillating. Resonance frequency, resonance amplitude and phase are measured. In static mode, the bending of the cantilever is registered. The combination of the modes enables the different measured variables to be determined simultaneously. A flow influences the movement behaviour of the sensor, which allows the flow velocity to be deduced. In addition to determining the flow velocity, it is also possible to detect different types of gas. Each medium has certain properties (density and viscosity) which have different effects on the bending of the sensor. As a result, it is possible to measure the mixing ratio of a known binary gas mixture and their flow velocity simultaneously with a single sensor. In this paper this is investigated using the example of the air–carbon-dioxide mixture

Tip- and laser-based 3D nanofabrication in extended macroscopic working areas

The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable: custom design and solutions for specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel patterning technologies. International society for optics and photonics. SPIE, Bellingham, 2021. https://doi.org/10.1117/12.2593229). For this reason, new aspects arise for future lithography, which is why enormous effort has been directed to the development of alternative fabrication technologies. Yet, the technologies emerging from this process, which are promising for coping with the current resolution and accuracy challenges, are only demonstrated as a proof-of-concept on a lab scale of several square micrometers. Such scale is not adequate for the requirements of modern lithography; therefore, there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies. Similar challenges arise because of the technical progress in various other fields, realizing new and unique functionalities based on nanoscale effects, e.g., in nanophotonics, quantum computing, energy harvesting, and life sciences. Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks, which are available at the Technische Universität Ilmenau in the form of nanopositioning and nanomeasuring (NPM) machines. With this equipment, the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters

Measurement Precision of a Planar Nanopositioning Machine with a Range of Motion of Ø100 mm

This work deals with various investigations into the accuracy of a newly developed planar nanopositioning machine. This machine, called Nanofabrication Machine 100 (NFM-100), has a positioning range of 100 mm in diameter. To determine the precision, various movement scenarios are performed with the machine table, and the trajectory deviation from the set trajectory is determined. In particular, the focus is on high velocities of up to 20 mm/s. Even at high speeds in the range of several millimetres per second, this machine can impress with its performance and only has a deviation in the nanometre range

Investigations on long-range AFM scans using a nanofabrication machine (NFM-100)

The focus of this work lies on investigations on a new Nano Fabrication Machine (NFM-100) with a mounted atomic force microscope (AFM). This installed tip-based measuring system uses self-sensing and self-actuated microcantilevers, which can be used especially for field-emission scanning probe lithography (FESPL). The NFM-100 has a positioning range of Ø 100 mm, which offers, in combination with the tip-based measuring system, the possibility to analyse structures over long ranges. Using different gratings, the accuracy and the reproducibility of the NFM-100 and the AFM-system will be shown

Gas-Flow Sensor Based on Self-Oscillating and Self-Sensing Cantilever

In this work the application of a self-sensing and self-actuating cantilever for gas-flow measurement is investigated. The cantilever placed in the flow is excited permanently at its first resonance mode. Simultaneously the resonance amplitude, the resonance frequency and the static bending of the cantilever are detected. All three sizes are related to the velocity of the gas-flow

Tip-based nanofabrication below 40 nm combined with a nanopositioning machine with a movement range of Ø100 mm

In this paper, the combination of an advanced nanopositioning technique and a tip-based system, which can be used as an atomic force microscope (AFM) and especially for field emission scanning probe lithography (FESPL) is presented. This is possible through the use of active microcantilevers that allow easy switching between measurement and write modes. The combination of nanopositioning and nanomeasuring machines and tip-based systems overcomes the usual limitations of AFM technology and makes it possible to perform high-precision surface scanning and nanofabrication on wafer sizes up to 4 in. We specifically discuss the potential of nanofabrication via FESPL in combination with the nanofabrication machine (NFM-100). Results are presented, where nanofabrication is demonstrated in form of a spiral path over a total length of 1 mm and the potential of this technique in terms of accuracy is discussed. Furthermore, ten lines were written with a pitch of 100 nm and a linewidth below 40 nm was achieved, which is in principle possible over the entire range of motion