50 research outputs found

    Electron effective mass in In0.33Ga0.67N determined by mid- infrared optical Hall effect

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    Mid-infrared optical Hall effect measurements are used to determine the free charge carrier parameters of an unintentionally doped wurtzite-structure c-plane oriented In0.33Ga0.67N epitaxial layer. Room temperature electron effective mass parameters of m_ ¼ ð0:20560:013Þm0 andm_k ¼ ð0:20460:016Þm0 for polarization perpendicular and parallel to the c-axis, respectively,were determined. The free electron concentration was obtained as (1.760.2)_1019 cm-3. Within our uncertainty limits, we detect no anisotropy for the electron effective mass parameter and we estimate the upper limit of the possible effective mass anisotropy as 7%. We discuss the influence of conduction band nonparabolicity on the electron effective mass parameter as a function of In content. The effective mass parameter is consistent with a linear interpolation scheme between the conduction band mass parameters in GaN and InN when the strong nonparabolicity in InN is included. The In0.33Ga0.67N electron mobility parameter was found to be anisotropic, supporting previous experimental findings for wurtzite-structure GaN, InN, and AlxGa1_xN epitaxial layers with c-plane growth orientation

    Electron effective mass in In0.33Ga0.67N determined by mid- infrared optical Hall effect

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    Mid-infrared optical Hall effect measurements are used to determine the free charge carrier parameters of an unintentionally doped wurtzite-structure c-plane oriented In0.33Ga0.67N epitaxial layer. Room temperature electron effective mass parameters of m_ ¼ ð0:20560:013Þm0 andm_k ¼ ð0:20460:016Þm0 for polarization perpendicular and parallel to the c-axis, respectively,were determined. The free electron concentration was obtained as (1.760.2)_1019 cm-3. Within our uncertainty limits, we detect no anisotropy for the electron effective mass parameter and we estimate the upper limit of the possible effective mass anisotropy as 7%. We discuss the influence of conduction band nonparabolicity on the electron effective mass parameter as a function of In content. The effective mass parameter is consistent with a linear interpolation scheme between the conduction band mass parameters in GaN and InN when the strong nonparabolicity in InN is included. The In0.33Ga0.67N electron mobility parameter was found to be anisotropic, supporting previous experimental findings for wurtzite-structure GaN, InN, and AlxGa1_xN epitaxial layers with c-plane growth orientation

    Low Al-content n-type AlxGa1-xN layers with a high-electron-mobility grown by hot-wall metalorganic chemical vapor deposition

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    In this work, we demonstrate the capability of the hot-wall metalorganic\ua0chemical vapor deposition\ua0to deliver high-quality\ua0n-AlxGa1−xN (x\ua0= 0\ua0–\ua00.12, [Si] = 1 71017\ua0cm−3)\ua0epitaxial layers\ua0on 4H-SiC(0001). All layers are crack-free, with a very small root mean square roughness (0.13\ua0–\ua00.25 nm), homogeneous distribution of Al over film thickness and a very low unintentional incorporation of oxygen at the detection limit of 5 71015\ua0cm−3\ua0and carbon of 2 71016\ua0cm−3. Edge type dislocations in the layers gradually increase with increasing Al content while\ua0screw dislocations\ua0only raise for\ua0x\ua0above 0.077. The room temperature\ua0electron mobility\ua0of the\ua0n-AlxGa1−xN remain in the range of 400\ua0–\ua0470 cm2/(V.s) for Al contents between 0.05 and 0.077 resulting in comparable or higher Baliga figure of merit with respect to GaN, and hence demonstrating their suitability for implementation as drift layers in power device applications. Further increase in Al content is found to result in significant deterioration of the electrical properties
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