A 30-cm diameter argon ion source

A 30 cm diameter argon ion source was evaluated. Ion source beam currents up to 4a were extracted with ion energies ranging from 0.2 to 1.5 KeV. An ion optics scaling relation was developed for predicting ion beam extraction capability as a function of total extraction voltage, gas type, and screen grid open area. Ignition and emission characteristics of several hollow cathode geometries were assessed for purposes of defining discharge chamber and neutralizer cathodes. Also presented are ion beam profile characteristics which exhibit broad beam capability well suited for ion beam sputtering applications

Performance of a magnetic multipole line-cusp argon ion thruster

A 17 cm diameter line cusp ion thruster was evaluated with inert gases which are candidate propellants for on orbit and orbit transfer propulsion functions for Large Space Systems. A semiempirical relationship was generated to predict thruster beam current in terms of plasma parameters which would allow initial thruster optimization without ion extraction and the associated large vacuum facilities. The sensitivity of performance to changes in discharge electrode configurations and magnetic circuit was evaluated and is presented. After final optimization a propellant utilization efficiency of 0.9 at a discharge chamber power expenditure of about 260 w per beam ampere was obtained. These performance parameters are the highest yet achieved with argon propellant

Improved ion containment using a ring-cusp ion thruster

A 30-centimeter diameter ring-cusp ion thruster is described which operates at inert gas ion beam currents up to about 7 ampere, with significant improvements in discharge chamber performance over conventional divergent-field thrusters. The thruster has strong boundary ring-cusp magnetic fields, a diverging field on the cathode region, and a nearly field-free volume upstream of the ion extraction system. Minimum ion beam production costs of 90 to 100 watts per beam ampere (W/A) were obtained for argon, krypton and xenon. Propellant efficiencies in excess of 0.90 were achieved at 100 to 120 W/A for the three inert gases. The ion beam charge-state was documented with a collimating mass spectrometer probe to allow evaluation of overall thruster efficiencies

Ion beam sputtering of fluoropolymers

Ion beam sputter processing rates as well as pertinent characteristics of etched targets and films are described. An argon ion beam source was used to sputter etch and deposit the fluoropolymers PTFE, FEP, and CTFE. Ion beam energy, current density, and target temperature were varied to examine effects on etch and deposition rates. The ion etched fluoropolymers yield cone or spire-like surface structures which vary depending upon the type of polymer, ion beam power density, etch time, and target temperature. Sputter target and film characteristics documented by spectral transmittance measurements, X-ray diffraction, ESCA, and SEM photomicrographs are included

A hollow cathode hydrogen ion source

High current density ion sources have been used to heat plasmas in controlled thermonuclear reaction experiments. High beam currents imply relatively high emission currents from cathodes which have generally taken the form of tungsten filaments. A hydrogen ion source is described which was primarily developed to assess the emission current capability and design requirements for hollow cathodes for application in neutral injection devices. The hydrogen source produced ions by electron bombardment via a single hollow cathode. Source design followed mercury ion thruster technology, using a weak magnetic field to enhance ionization efficiency

Optical and electrical properties of ion beam textured Kapton and Teflon

An electron bombardment argon ion source was used to ion etch polyimide (Kapton) and fluorinated ethylene, FEP (Teflon). Samples of polyimide and FEP were exposed to (0.5-1.0) keV Ar ions at ion current densities of (1.0-1/8) mA/sq cm for various exposure times. Changes in the optical and electrical properties of the samples were used to characterize the exposure. Spectral reflectance and transmittance measurements were made between 0.33 and 2.16 micron m using an integrating sphere after each exposure. From these measurements, values of solar absorptance were obtained. Total emittance measurements were also recorded for some samples. Surface resistivity was used to determine changes in the electrical conductivity of the etched samples. A scanning electron microscope recorded surface structure after exposure. Spectral optical data, resistivity measurements, calculated absorptance and emittance measurements are presented along with photomicrographs of the surface structure for the various exposures to Ar ions

Thermal barrier coating system having improved adhesion

The adherence between a ceramic thermal barrier coating and a metal bond coating is improved by ion sputtering a ceramic film on the bond cost. A ceramic thermal barrier coating is then plasma-sprayed onto this primer film. This improves the integrity and strength of the interface between the plasma-sprayed ceramic layer and metallic bond coat which insures stronger adherence between the metal and the ceramic

Advanced propulsion for LEO and GEO platforms

Mission requirements and mass savings applicable to specific low earth orbit and geostationary earth orbit platforms using three highly developed propulsion systems are described. Advanced hypergolic bipropellant thrusters and hydrazine arcjets can provide about 11 percent additional instrument payload to 14,000 kg LEO platforms. By using electric propulsion on a 8,000 kg class GEO platform, mass savings in excess of 15 percent of the beginning-of-life platform mass are obtained. Effects of large, advanced technology solar arrays and antennas on platform propulsion requirements are also discussed

Apparatus for producing oxidation protection coatings for polymers

A polymeric substrate is coated with a metal oxide film to provide oxidation protection in low Earth orbital environments. The film contains about 4 volume percent polymer to provide flexibility. A coil of polymer materials moves through an ion beam as it is fed between reels. The ion beam first cleans the polymer material surface and then sputters the film material from a target onto this surface

Surface texturing of fluoropolymers

A method is disclosed for improving surface texture for adhesive bonding, metal bonding, substrate plating, decal substrate preparation, and biomedical implant applications. The surface to be bonded is dusted in a controlled fashion to produce a disbursed layer of fine mesh particles which serve as masks. The surface texture is produced by impinging gas ions on the masked surface. The textured surface takes the form of pillars or cones. The bonding material, such as a liquid epoxy, flows between the pillars which results in a bond having increased strength. For bonding metals a thin film of metal is vapor or sputter deposited onto the textured surface. Electroplating or electroless plating is then used to increase the metal thickness in the desired amount