Untersuchungen zum Nanoprägen als Fertigungsverfahren für fluidische Mikro-Nano-Systeme

Um die Funktionalität der Mikrosystemtechnik durch die Integration von Nanometerstrukturen erweitern zu können, müssen industriekompatible Produktionstechnologien entwickelt werden. Die Intention der vorliegenden Arbeit ist es, einen möglichen Lösungsansatz durch Untersuchungen zum Nanoprägen als ein für die Nanostrukturierung von Kunststoffen adaptiertes Heissprägeverfahren weiterzuentwickeln und den Nutzen durch Applikationsbeispiele aus dem Bereich der Life-Sciences zu veranschaulichen

Novel Concept of Micro Patterned Micro Titer Plates Fabricated via UV-NIL for Automated Neuronal Cell Assay Read-Out

The UV-nanoimprint lithography(UV-NIL) fabrication of a novel network of micron-sized channels, forming an open channel microfluidic system is described. Details about the complete manufacturing process, from mastering to fabrication in small batches and in high throughput with up to 1200 micro titer plates per hour is presented. Deep insight into the evaluation of a suitable UV-curable material, mr-UVCur26SF is given, presenting cytotoxic evaluation, cell compatibility tests and finally a neuronal assay. The results indicate how the given pattern, in combination with the resist, paves the way to faster, cheaper, and more reliable drug screening.This project has received funding from the European Union’s Horizon 2020 research and innovation programme under grant agreement NO. 646260. The research was also partially supported by NextGenMicrofluidics project under HORIZON2020 with grant agreement no 862092

New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps

Herein, we report on a newly developed and commercialized organic photo-curable Nanoimprint Lithography (NIL) resist, namely mr-NIL210. Since this new NIL resist follows an innovative design concept and contains solely specific monomers with a characteristic chemistry and molecular design, an extended longevity of applied polydimethyl siloxane (PDMS) stamps is enabled addressing a crucial key metric for industrial high-volume manufacturing processes. Moreover, the mr-NIL210 is characterized by a negligible oxygen sensitivity of the curing chemistry, outstanding film forming and adhesion performances as well as excellent plasma-based dry etch characteristics for various substrate materials like silicon, aluminum, sapphire, titanium, etc