Effect of Argon-Oxygen Mixing Gas during Magnetron Sputtering on TiO 2

A reactive r.f magnetron sputtering method was used to deposit titanium dioxide coating on stainless steel substrates without intentional heating or biasing. The purpose of this work is given to study the argon-oxygen mixing gas on the corrosion behavior of TiO2 coatings. The morphology and structure of the coatings were studied by X-ray diffraction (XRD). Potentiodynamic polarization was used to study the corrosion behavior of the coatings. The results obtained from potentiodynamic polarization curves showed that TiO2 coatings possessed higher corrosion resistance than uncoated substrate

Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications

Titanium carbide (TiC) hard coatings have been obtained on steel and silicon substrates by rf magnetron sputtering process. Two layer coatings have been deposited in order to improve adhesion on steel. The lower layer was titanium metal and the upper TiC layer was obtained by reactive sputtering of the titanium target in Ar and methane gas mixture. The study confirmed that the TiC layer composition depends on the reactive sputtering gas composition and substrate bias voltage. Film microhardness was measured by microindentation. Measurement results showed that the hardness coating depends on the microstructure of our coatings and the polarization of bias substrate is an important parameter to control the microstructure

Effect of the Plasma Deposition Parameters on the Properties of Ti/TiC Multilayers for Hard Coatings Applications

Titanium carbide (TiC) hard coatings have been obtained on steel and silicon substrates by rf magnetron sputtering process. Two layer coatings have been deposited in order to improve adhesion on steel. The lower layer was titanium metal and the upper TiC layer was obtained by reactive sputtering of the titanium target in Ar and methane gas mixture. The study confirmed that the TiC layer composition depends on the reactive sputtering gas composition and substrate bias voltage. Film microhardness was measured by microindentation. Measurement results showed that the hardness coating depends on the microstructure of our coatings and the polarization of bias substrate is an important parameter to control the microstructure

AES depth profiles in Mo-coated 304L stainless steel achieved by RF-magnetron sputtering and influence of Mo on the corrosion in 3.5% NaCl solution

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