Incorporation of nitrogen into TiO2 thin films during PVD processes

In this paper we investigate the possibility of incorporating nitrogen into amorphous, photocatalytic TiO2 thin films, prepared at room temperature, during the growth process. The aim is to reduce the bandgap of the UV active thin films. Physical vapor deposition experiments employing a titanium vacuum arc with gas backfill ranging from pure oxygen to pure nitrogen, are carried out. The resulting films are characterized for chemical composition, phase composition, optical properties and hydrophilicity in order to determine a correlation between gas composition and thin film properties. The experimental results point that a visible change in the band structure of the deposited layers is achieved

Rutile formation and oxygen diffusion in oxygen-PIII treated Titanium

Rutile formation and oxygen diffusion in oxygen-PIII treated Titanium / G. Thorwarth, S. Mändl, B. Rauschenbach. – In: Surface and coatings technology. 136. 2001. S. 236-24

Thin film deposition using energetic ions

One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes. © 2010 by the authors

Textured Titanium oxide thin films produced by vacuum arc deposition

Textured Titanium oxide thin films produced by vacuum arc deposition / S. Mändl, G. Thorwarth, B. Rauschenbach. – In: Surface and coatings technology. 133/134. 2000. S. 283-28

Plasma immersion ion implantation using Titanium and oxygen ions

Plasma immersion ion implantation using Titanium and oxygen ions / G. Thorwarth, S. Mändl, B. Rauschenbach. – In: Surface and coatings technology. 128/129. 2000. S. 116-12

Influence of ion energy on Titanium oxide formation by vacuum arc deposition and implantation

Influence of ion energy on Titanium oxide formation by vacuum arc deposition and implantation / G. Thorwarth ... – In: Nuclear instruments and methods in physics research. B. 178. 2001. S. 148-15