Periodic Variation of Stress in Sputter Deposited Si/WSi2 Multilayers

A tension increment after sputter deposition of 1 nm of WSi2 onto sputtered Si was observed at low Ar gas pressures. Wafer curvature data on multilayers were found to have a periodic variation corresponding to the multilayer period, and this permitted statistical analyses to improve the sensitivity to small stresses. The observation of tension instead of compression in the initial stage of growth is new and a model invoking surface rearrangement is invoked. The data also bear on an unusual surface smoothing phenomena for sputtered Si surfaces caused by the sputter deposition of WSi2 . We furthermore report that for low Ar pressures the Si layers are the predominant source of built-up stress

The effect of ultra-violet rays on the dermatitis preventing vitamin

Publication authorized November 7, 1932"The data presented in this paper formed part of a thesis presented by Luther R. Richardson in partial fulfillment of the requirements for the Degree of Doctor of Philosophy in the Graduate School of the University of Missouri, 1932"--P. [3].Digitized 2007 AES.Includes bibliographical references (page 18)

Skin lesions of the rat associated with vitamin B complex

Publication authorized June 3, 1936.Digitized 2007 AES.Includes bibliographical references (pages 35-36)

Pressure-dependent transition from atoms to nanoparticles in magnetron sputtering: Effect on WSi2 film roughness and stress

We report on the transition between two regimes from several-atom clusters to much larger nanoparticles in Ar magnetron sputter deposition of WSi2, and the effect of nanoparticles on the properties of amorphous thin films and multilayers. Sputter deposition of thin films is monitored by in situ x-ray scattering, including x-ray reflectivity and grazing incidence small angle x-ray scattering. The results show an abrupt transition at an Ar background pressure Pc; the transition is associated with the threshold for energetic particle thermalization, which is known to scale as the product of the Ar pressure and the working distance between the magnetron source and the substrate surface. Below Pc smooth films are produced, while above Pc roughness increases abruptly, consistent with a model in which particles aggregate in the deposition flux before reaching the growth surface. The results from WSi2 films are correlated with in situ measurement of stress in WSi2/Si multilayers, which exhibits a corresponding transition from compressive to tensile stress at Pc. The tensile stress is attributed to coalescence of nanoparticles and the elimination of nano-voids.Comment: 16 pages, 10 figures; v3: published versio

Recrystallization of epitaxial GaN under indentation

We report recrystallization of epitaxial (epi-) GaN(0001) film under indentation.Hardness value is measured close to 10 GPa, using a Berkovich indenter. Pop-in burst in the loading line indicates nucleation of dislocations setting in plastic motion of lattice atoms under stress field for the recrystallization process. Micro-Raman studies are used to identify the recrystallization process. Raman area mapping indicates the crystallized region. Phonon mode corresponding to E2(high) close to 570 cm-1 in the as-grown epi-GaN is redshifted to stress free value close to 567 cm-1 in the indented region. Evolution of A1(TO) and E1(TO) phonon modes are also reported to signify the recrystallization process.Comment: 10 pages, 3 figures

Vitamin B?��, pantothenic acid, and unsaturated fatty acids as they affect dermatitis in rats

Publication authorized September 20, 1941.Includes bibliographical references (pages 11-12)

The relation of biotin to perosis in chicks

Publication authorized June 3, 1942.Digitized 2007 AES.Includes bibliographical references (page 10)

Soybean oil meal as a protein supplement for baby chicks

Publication authorized September 14, 1945.Digitized 2007 AES.Includes bibliographical references (page 19)

Critical vitamins in rations for baby chicks

Publication authorized May 10, 1945.Includes bibliographical references (page 12)