Laundry and cleaning composition for fabric washing, and for hard surfaces including interiors of ovens, includes metal complex comprising transition metal atom including manganese, oxygen bleaching agent, and adjunct materials

NOVELTY - A laundry and cleaning composition comprises metal complex (1-99.9 pts.wt.), an oxygen bleaching agent, and adjunct materials. The metal complex comprises a transition metal atom including manganese, iron, cobalt, chromium, nickel, copper, vanadium, molybdenum, tungsten, palladium, ruthenium; and a cross-bridged macropolycyclic ligand comprising an organic macrocycle ring comprising greater than or equal to 4 donor atoms. USE - A laundry and cleaning composition for fabric washing, and for hard surfaces (including interiors of ovens, kitchen surfaces, or bathroom surfaces). ADVANTAGE - The composition has superior bleaching compared to compositions not having the selected transition-metal bleach catalyst. The superiority in bleaching is obtained using very low levels of transition-metal bleach catalyst. It controls or kills microorganisms including bacteria, viruses, sub-viral particles, and molds; and destroys objectionable non-living proteins and/or peptides. DETAILED DESCRIPTION - A laundry and cleaning composition comprises metal complex (1-99.9 pts.wt.), an oxygen bleaching agent, and adjunct materials. The metal complex comprises a transition metal atom including manganese (Mn) (II), Mn (III), Mn (IV), Mn (V), iron (Fe) (II), Fe(III), Fe(IV), cobalt (Co) (I), Co(II), Co(III), chromium (Cr) (II), Cr (III), Cr(IV), Cr(V), Cr(VI), nickel (Ni)(II), Ni (III), copper (Cu) (I), Cu(II), Cu(III), vanadium (V) (III), V(IV), V(V), molybdenum (Mo) (IV), Mo(V), Mo(VI), tungsten (W) (IV), W(V), W(VI), palladium (Pd) (II), ruthenium (Ru) (II), Ru(III), or Ru(IV); and a cross-bridged macropolycyclic ligand comprising an organic macrocycle ring comprising greater than or equal to 4 donor atoms, where 2 of the donor atoms being non-adjacent donor atoms, and a moiety that comprises a 2-10C cross-bridged chain that covalently connects greater than or equal to 2 non-adjacent donor atoms of the organic macrocycle ring, the covalently connected donor atoms being donor atoms that are coordinated to the transition metal

Laundry and cleaning composition comprises metal complex comprising transition metal and cross-bridge macropolycyclic ligand comprising organic macrocycle ring and cross-bridge chain moiety

NOVELTY - A laundry and cleaning composition comprises metal complex (1 ppb to 99.9%), oxygen bleaching agent, and additives (balance). The metal complex comprises transition metal and cross-bridge macropolycyclic ligand comprising organic macrocycle ring and moiety comprising cross-bridged chain that covalently connects non-adjacent donor atoms of organic macrocycle ring. The organic macrocycle ring comprises donor atoms that are coordinated to transition metal; and non-donor atoms to separate the donor atoms from each other by covalent linkages of non-donor atom. USE - For use as laundry composition and automatic dishwashing detergents. ADVANTAGE - The composition provides enhanced cleaning/bleaching benefits through the use of transition-metal bleach catalyst. DETAILED DESCRIPTION - A laundry and cleaning composition comprises metal complex (1 ppb to 99.9%), oxygen bleaching agent, and additives (balance). The metal complex comprises transition metal and cross-bridge macropolycyclic ligand comprising organic macrocycle ring and moiety comprising cross-bridged chain that covalently connects non-adjacent donor atoms of organic macrocycle ring. The organic macrocycle ring comprises four donor atoms, where two donor atoms are non-adjacent to donor atoms. The covalently connected donor atoms are donor atoms that are coordinated to transition metal. The cross-bridged chain comprises 2-10 atoms. The transition metal atom is manganese (Mn(II), Mn(III), Mn(IV) or Mn(V)), iron (Fe(II), Fe(III) or Fe(IV)), cobalt (Co(I), Co(II) or Co(III)), chromium (Cr(II), Cr(III), Cr(IV), Cr(V) or C(VI)), nickel (Ni(II) or Ni(III)), copper (Cu(I), Cu(II) or Cu(III)), vanadium (V(III), V(IV) or V(V)), molybdenum (Mo(IV), Mo(V) or Mo(VI)), tungsten (W(IV), W(V) or W(V)), palladium (Pd(II)), or ruthenium (Ru(II), Ru(III) or Ru(IV)). The four donor atoms comprise nitrogen, oxygen, sulfur or phosphorus. The organic macrocycle ring may further comprise non-donor atoms to separate the donor atoms from each other by covalent linkages of non-donor atom. When cross-bridged macropolycyclic ligand comprises less than six donor atoms coordinated to the transition metal, there is sufficient number of non-macropolycyclic ligands to complete coordination sphere of the transition metal atom. When the transition metal's charge is not neutralized by the non-macropolycyclic ligands, there is sufficient number of counterions to provide metal complex with charge neutrality

Synchrotron radiation for microstructure fabrication

Most of the presently known microstructures are still fabricated using silicon-based technologies. However, in the case of fabrication using anisotropic etching, geometrical limitations due to the crystallographic nature of silicon prevent the design of any in-place structure shapes. If microsystems, built by means of reactive ion etching and sacrificial layer technology do have freedom for lateral geometry, they are limited to a few micrometers height only. Nevertheless, and in spite of difficulties to always answer the demands in the best way, real microsystems are produced by these techniques and are currently present on the market. To overpass these limitations, other technologies have been studied and developed in recent years. Among them the LIGA process (German acronym for Lithography, Electroplating, Molding), which uses synchrotron radiation and in particular its hard X-Ray spectrum, is certainly the most promising one regarding to, very high aspect ratio, submicron precision, arbitrary pattering and mass production capabilities. Furthermore, LIGA can handle a large variety of materials to fabricate microsystems

Deep etch X-ray lithography using silicon-gold masks fabricated by deep etch UV lithography and electroforming

This paper is devoted to the description of a low cost microfabrication process for the realization of deep etch X-ray lithography (DEXRL) masks. These masks are composed of a 15 mu m thick silicon membrane supporting gold absorbers which are typically 12 to 16 mu m thick. The resolution of such masks is limited to 2-4 mu m, but they allow irradiation up to 2 mm of polymethylmethacrylate (PMMA) by using hard X-ray synchrotron radiation. Theoretical results about dosimetric parameters for the PMMA irradiation are presented. Results obtained with these masks are also given. The purpose of this study is the realization of low cost micromechanical components using the LIGA technique