Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors

Abstract An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the 'water window' spectral range (λ= 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization

Roadmap on holography

From its inception holography has proven an extremely productive and attractive area of research. While specific technical applications give rise to 'hot topics', and three-dimensional (3D) visualisation comes in and out of fashion, the core principals involved continue to lead to exciting innovations in a wide range of areas. We humbly submit that it is impossible, in any journal document of this type, to fully reflect current and potential activity; however, our valiant contributors have produced a series of documents that go no small way to neatly capture progress across a wide range of core activities. As editors we have attempted to spread our net wide in order to illustrate the breadth of international activity. In relation to this we believe we have been at least partially successful.This work was supported by Ministerio de Economía, Industria y Competitividad (Spain) under projects FIS2017-82919-R (MINECO/AEI/FEDER, UE) and FIS2015-66570-P (MINECO/FEDER), and by Generalitat Valenciana (Spain) under project PROMETEO II/2015/015

Single-Shot near Edge X-ray Fine Structure (NEXAFS) Spectroscopy Using a Laboratory Laser-Plasma Light Source

We present a proof of principle experiment on single-shot near edge soft X-ray fine structure (NEXAFS) spectroscopy with the use of a laboratory laser-plasma light source. The source is based on a plasma created as a result of the interaction of a nanosecond laser pulse with a double stream gas puff target. The laser-plasma source was optimized for efficient soft X-ray (SXR) emission from the krypton/helium target in the wavelength range from 2 nm to 5 nm. This emission was used to acquire simultaneously emission and absorption spectra of soft X-ray light from the source and from the investigated sample using a grazing incidence grating spectrometer. NEXAFS measurements in a transmission mode revealed the spectral features near the carbon K-α absorption edge of thin polyethylene terephthalate (PET) film and L-ascorbic acid in a single-shot. From these features, the composition of the PET sample was successfully obtained. The NEXAFS spectrum of the L-ascorbic acid obtained in a single-shot exposure was also compared to the spectrum obtained a multi-shot exposure and to numerical simulations showing good agreement. In the paper, the detailed information about the source, the spectroscopy system, the absorption spectra measurements and the results of the studies are presented and discussed

Optical elements for the extreme ultraviolet and soft X-ray range

The article presents the physical basis and overview of optical elements for the rangeincluding extreme ultraviolet (EUV) and soft X-ray (SXR). The first chapter contains an introductionto the subject under review and physical fundamentals. The second chapter presents the basics ofoptics for the EUV/SXR range, along with highlighting its advantages and disadvantages. The thirdchapter discusses in detail optical components such as optical filters, mirrors (including multilayers),diffraction gratings, Fresnel zone plates, and hybrid solutions. The fourth chapter presents a wide rangeof applications of EUV/SXR optics. The final chapter summarises the information presented earlier.Keywords: automation, electronic and electrical engineering, soft X-rays, extreme ultraviolet, opticalelements, optical filters, multilayer mirrors, diffraction gratings, Fresnel zone plate

Wideband spectral emission measurements from laser-produced plasma EUV/SXR source based on a double gas puff target

We present spectral emission characteristics from laser-plasma EUV/SXR sources produced by irradiation of < 1 J energy laser pulse on eleven different double stream gas puff targets, with most intense electronic transitions identified in the spectral range from 1 nm to 70 nm wavelength which corresponds to photon energy from 18 eV to 1240 eV. The spectra were obtained using grazing incidence and transmission spectrographs from laser-produced plasma emission, formed by the interaction of a laser beam with a double stream gas puff target. Laser pulses with a duration of 4 ns and energy of 650 mJ were used for the experiment. We present the results obtained from three different spectrometers in the wavelength ranges of SXR (1-5.5 nm), SXR/EUV (4-15.5 nm), and EUV (10-70 nm). In this paper, detailed information about the source, gas targets under investigation, the experimental setup, spectral measurements and the results are presented and discussed. Such data may be useful for the identification of adequate spectral emissions from gasses in the EUV and SXR wavelength ranges dedicated to various experiments (i.e. broadband emission for the X-ray coherence tomography XCT) or may be used for verification of magnetohydrodynamic plasma codes

Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma

In this work, the effect of extreme ultraviolet (EUV) radiation and the combination of EUV radiation and low-temperature nitrogen plasma on the physico-chemical properties of polyetheretherketone (PEEK) surfaces were presented. The laser-plasma EUV source based on a double gas puff target was used in this experiment to irradiate PEEK surfaces with nanosecond pulses of EUV radiation and to produce low-temperature plasma through the photoionization of nitrogen with EUV photons. The changes in surface morphology on irradiated polymer samples were examined using atomic force microscopy (AFM) and scanning electron microscopy (SEM). Chemical changes of the PEEK surfaces were analysed using X-ray photoelectron spectroscopy (XPS). EUV radiation and nitrogen plasma treatment caused significant changes in the topography of modified PEEK&rsquo;s surfaces and an increase in their average roughness. Strong chemical decomposition, appearance of new functional groups as well as incorporation of nitrogen atoms up to ~17 at.% on the PEEK&rsquo;s surface were observed

NEXAFS at nitrogen K-edge and titanium L-edge using a laser-plasma soft x-ray source based on a double-stream gas puff target

We present a possibility of reaching higher energy absorption edges of organic materials, beyond the carbon K-edge, in the near edge X-ray absorption fine structure (NEXAFS) spectroscopy technique using a compact laser-produced plasma soft X-ray (SXR) source based on a double-stream gas puff target. The source was optimized for emission in the SXR spectral range from 1.5 to 5 nm wavelength using the krypton/helium target. The emission spectrum of the source and the absorption spectrum of the investigated sample were measured simultaneously by means of a grazing incidence spectrometer, equipped with a single, large aperture diffractive element. Based on both spectra, the optical density was computed for the silicon nitride membranes in a transmission mode, to reveal the NEXAFS features near the nitrogen K-edge. Moreover, due to spectral narrowing of the SXR emission by the use of titanium filter, reaching the titanium L-edge was also possible. Multiple SXR pulse data were compared to single SXR pulse (single-shot) data as well as to the numerical simulations. In this paper, the detailed information about the source, spectroscopy system, and the results of NEXAFS measurements is presented and discussed

Structural Stability and Disorder Level of Moderately Reduced Paper-like Graphene Oxide Investigated with Micro-Raman Analysis

This paper discusses the results of the micro-Raman analysis performed on paper-like graphene oxide (GO) samples consisting of many functionalised graphene layers and annealed at moderate temperatures (≤500 °C) under vacuum conditions (p ≃ 10−4 mbar). The analysis of the standalone samples revealed that the obtained material is characterised by a noticeable disorder level but still stays below the commonly accepted threshold of high or total disorder. GO formed in a simple way showed two spectral bands above 1650 cm−1 recorded very rarely or not at all and their origin has been discussed in detail. The results also confirmed the metastable character of multilayer GO after the annealing process at moderate temperatures as the C/O ratio was kept between 2 and 3 and the spectral features were stable within the annealing temperature range

Biological Applications of Short Wavelength Microscopy Based on Compact, Laser-Produced Gas-Puff Plasma Source

Over the last decades, remarkable efforts have been made to improve the resolution in photon-based microscopes. The employment of compact sources based on table-top laser-produced soft X-ray (SXR) in the &ldquo;water window&rdquo; spectral range (&lambda; = 2.3&ndash;4.4 nm) and extreme ultraviolet (EUV) plasma allowed to overcome the limitations imposed by large facilities, such as synchrotrons and X-ray free electron lasers (XFEL), because of their high complexity, costs, and limited user access. A laser-plasma double stream gas-puff target source represents a powerful tool for microscopy operating in transmission mode, significantly improving the spatial resolution into the nanometric scale, comparing to the traditional visible light (optical) microscopes. Such an approach allows generating the plasma efficiently, without debris, providing a high flux of EUV and SXR photons. In this review, we present the development and optimization of desktop imaging systems: a EUV and an SXR full field microscope, allowing to achieve a sub-50 nm spatial resolution with short exposure time and an SXR contact microscope, capable to resolve internal structures in a thin layer of sensitive photoresist. Details about the source, as well as imaging results for biological applications, will be presented and discussed

Photoionized plasmas induced in molecular gases by extreme ultraviolet and X-ray pulses

In this work a laser-produced plasma (LPP) source was used to create low temperature plasmas. An extreme ultraviolet and soft X-ray (EUV/SXR) radiation pulse was used for ionization of molecular gases, injected into a vacuum chamber synchronously with the EUV/SXR pulse. Energies of photons exceeding 100 eV were sufficient for dissociative ionization, ionization of atoms or even ions. The resulting photoelectrons had also enough energy for further ionizations or excitations. Time resolved UV/VIS spectra, corresponding to single charged ions, molecules and molecular ions, were recorded. For spectral lines, corresponding to radiative transitions in F II and S II ions, electron temperature was calculated based on a Boltzmann plot method. Numerical simulations of the molecular spectra were fitted to the experimental spectra allowing for determination of vibrational and rotational temperatures