Strong Bulk Photovoltaic Effect in Planar Barium Titanate Thin Films

The bulk photovoltaic effect (BPE) leads to the generation of a photocurrent from an asymmetric material. Despite drawing much attention due to its ability to generate photovoltages above the band gap ($E_g$), it is considered a weak effect due to the low generated photocurrents. Here, we show that a remarkably high photoresponse can be achieved by exploiting the BPE in simple planar BaTiO$_3$ (BTO) films, solely by tuning their fundamental ferroelectric properties via strain and growth orientation induced by epitaxial growth on different substrates. We find a non-monotonic dependence of the responsivity ($R_{\rm SC}$) on the ferroelectric polarization ($P$) and obtain a remarkably high BPE coefficient ($\beta$) of $\approx$10$^{-2}$ 1/V, which to the best of our knowledge is the highest reported to date for standard planar BTO thin films. We show that the standard first-principles-based descriptions of BPE in bulk materials cannot account for the photocurrent trends observed for our films and therefore propose a novel mechanism that elucidates the fundamental relationship between $P$ and responsivity in ferroelectric thin films. Our results suggest that practical applications of ferroelectric photovoltaics in standard planar film geometries can be achieved through careful joint optimization of the bulk structure, light absorption, and electrode-absorber interface properties.Comment: 12 pages, 8 figure

Resonant domain-wall-enhanced tunable microwave ferroelectrics.

Ordering of ferroelectric polarization1 and its trajectory in response to an electric field2 are essential for the operation of non-volatile memories3, transducers4 and electro-optic devices5. However, for voltage control of capacitance and frequency agility in telecommunication devices, domain walls have long been thought to be a hindrance because they lead to high dielectric loss and hysteresis in the device response to an applied electric field6. To avoid these effects, tunable dielectrics are often operated under piezoelectric resonance conditions, relying on operation well above the ferroelectric Curie temperature7, where tunability is compromised. Therefore, there is an unavoidable trade-off between the requirements of high tunability and low loss in tunable dielectric devices, which leads to severe limitations on their figure of merit. Here we show that domain structure can in fact be exploited to obtain ultralow loss and exceptional frequency selectivity without piezoelectric resonance. We use intrinsically tunable materials with properties that are defined not only by their chemical composition, but also by the proximity and accessibility of thermodynamically predicted strain-induced, ferroelectric domain-wall variants8. The resulting gigahertz microwave tunability and dielectric loss are better than those of the best film devices by one to two orders of magnitude and comparable to those of bulk single crystals. The measured quality factors exceed the theoretically predicted zero-field intrinsic limit owing to domain-wall fluctuations, rather than field-induced piezoelectric oscillations, which are usually associated with resonance. Resonant frequency tuning across the entire L, S and C microwave bands (1-8 gigahertz) is achieved in an individual device-a range about 100 times larger than that of the best intrinsically tunable material. These results point to a rich phase space of possible nanometre-scale domain structures that can be used to surmount current limitations, and demonstrate a promising strategy for obtaining ultrahigh frequency agility and low-loss microwave devices

BaTiO₃ Thin Films from Atomic Layer Deposition: A Superlattice Approach

A superlattice approach for the atomic layer deposition of polycrystalline BaTiO₃ thin films is presented as an example for an effective route to produce high-quality complex oxide films with excellent thickness and compositional control. This method effectively mitigates any undesirable reactions between the different precursors and allows an individual optimization of the reaction conditions for the Ba–O and the Ti–O subcycles. By growth of nanometer thick alternating Ba­(OH)₂ and TiO₂ layers, the advantages of binary oxide atomic layer deposition are transferred into the synthesis of ternary compounds, permitting extremely high control of the cation ratio and superior uniformity. Whereas the Ba­(OH)₂ layers are partially crystalline after the deposition, the TiO₂ layers remain mostly amorphous. The layers react to polycrystalline, polymorph BaTiO₃ above 500 °C, releasing H₂O. This solid-state reaction is accompanied by an abrupt decrease in film thickness. Transmission electron microscopy and Raman spectroscopy reveal the presence of hexagonal BaTiO₃ in addition to the perovskite phase in the annealed films. The microstructure with relatively small grains of ∼70 Å and different phases is a direct consequence of the abrupt formation reaction. The electrical properties transition from the initially highly insulating dielectric semiamorphous superlattice into a polycrystalline BaTiO₃ thin film with a dielectric constant of 117 and a dielectric loss of 0.001 at 1 MHz after annealing at 600 °C in air, which, together with the suppression of ferroelectricity at room temperature, are very appealing properties for voltage tunable devices