Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices

Investigations of thin p-GaN light-emitting diodes with surface plasmon compatible metallization

We investigate device performance of InGaN light-emitting diodes with a 30-nm p-GaN layer. The metallization used to separate the p-contact from plasmonic metals, reveals limitations on current spreading which reduces surface plasmonic enhancement