HOT-ELECTRONS IN DELTA-DOPED GAAS(SI) LAYERS

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Effect of temperature on the optical properties of GaAsSbN/GaAs single quantum wells grown by molecular-beam epitaxy

GaAsSbN/GaAs strained-layer single quantum wells grown on a GaAs substrate by molecular-beam epitaxy with different N concentrations were studied using the photoluminescence (PL) technique in the temperature range from 9 to 296 K. A strong redshift in optical transition energies induced by a small increase in N concentration has been observed in the PL spectra. This effect can be explained by the interaction between a narrow resonant band formed by the N-localized states and the conduction band of the host semiconductor. Excitonic transitions in the quantum wells show a successive red/blue/redshift with increasing temperature in the 2-100 K range. The activation energies of nonradiative channels responsible for a strong thermal quenching are deduced from an Arrhenius plot of the integrated PL intensity. (C) 2003 American Institute of Physics

Band-edge modifications due to photogenerated carriers in single p-type delta-doped GaAs layers

The photogenerated carrier-induced band-edge modifications of beryllium single delta-doped GaAs layers com comprising a two-dimensional hole gas (2DHG) were investigated by means of photoluminescence, selective photoluminescence, and photoluminescence excitation spectroscopies. The results show direct evidence for a photoinduced electron confinement effect, which strongly enhances the radiative-recombination probability between electrons and holes of the 2DHG at low temperatures,5974634463

BROADENING OF THE SI DOPING LAYER IN PLANAR-DOPED GAAS IN THE LIMIT OF HIGH-CONCENTRATIONS

A series of samples of GaAs planar doped with Si, grown by MBE at low substrate temperatures and with different doping concentrations, is investigated. A comparison of Shubnikov-de Haas measurements and self-consistent numerical calculations shows that a broadening of the doped region occurs in spite of the low growth temperature. The broadening occurs via segregation of the Si impurities with the growth surface when the solid solubility limit of Si in GaAs is exceeded. For the growth conditions used this limit is determined to be (2.1 +/- 0.2) x 10(19) cm-3. At high doping densities an intrinsic compensation mechanism becomes active, limiting the concentration of conduction electrons.78979379