28 research outputs found

    Microdistribution of oxygen in silicon and its effects on electronic properties

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    The effects of interstitial oxygen on the electrical characteristics of Czochralski-grown silicon crystals were investigated for the first time on a microscale. It was found that the generation of thermal donors is not a direct function of the oxygen concentration. It was further found that the minority carrier life-time decreases with increasing oxygen concentration, on a microscale in as-grown crystals. It was thus shown, again for the first time, that oxygen in as grown crystals is not electronically inert as generally believed. Preannealing at 1200 C commonly employed in device fabrication, was found to suppress the donor generation at 450 C and to decrease the deep level concentrations

    Deposited charge measurements on silicon wafers after plasma treatment

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    Structural and Electronic Properties of Amorphous and Polycrystalline In2Se3 Films

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    Structural and electronic properties of amorphous and single-phase polycrystalline films of gamma- and kappa-In2Se3 have been measured. The stable gamma phase nucleates homogeneously in the film bulk and has a high resistivity, while the metastable kappa phase nucleates at the film surface and has a moderate resistivity. The microstructures of hot-deposited and post-annealed cold-deposited gamma films are quite different but the electronic properties are similar. The increase in the resistivity of amorphous In2Se3 films upon annealing is interpreted in terms of the replacement of In-In bonds with In-Se bonds during crystallization. Great care must be taken in the preparation of In2Se3 films for electrical measurements as the presence of excess chalcogen or surface oxidation may greatly affect the film properties.Comment: 23 pages and 12 figure

    Surface Photovoltage Measurement of Hydrogen‐Treated Si Surfaces

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    Surface photovoltage in silicon. Novel applications for chemical and biological sensing

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    The Surface Photovoltage technique has been recently employed for chemical and biological sensing. Selected chemical and biological species deposited on the crystalline silicon surface introduced surface barrier changes that were detected using the non-contact Surface Photovoltage mode. The magnitude of the surface barrier modifications provided a unique signature of the sensed species. The simplicity and sensitivity of this technique offer an exciting opportunity for a new type of low-cost sensing devices

    Relationship between the charging damage of test structures and the deposited charge on unpatterned wafers exposed to an electron cyclotron resonance plasma

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    Sequence-Specific Label-Free DNA Sensors Based on Silicon Nanowires

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