5 research outputs found
Features of special joints of grain boundaries in polysilicon films of equiaxial and dendritic structures
Comparative analysis of special grain boundary joints in polysilicon films with equiaxial and dendritic (undoped and phosphorus-doped) structure, prepared by low-pressure chemical vapor deposition, has been carried out using atomic force microscopy and transmission electron microscopy. The formation mechanisms of special grain boundary joints have been analyzed for different film structures. The effect of phosphorus on formation of grain boundary joints has been analyzed.ΠΠ΅ΡΠΎΠ΄Π°ΠΌΠΈ Π°ΡΠΎΠΌΠ½ΠΎΠΉ ΡΠΈΠ»ΠΎΠ²ΠΎΠΉ ΠΌΠΈΠΊΡΠΎΡΠΊΠΎΠΏΠΈΠΈ ΠΈ ΠΏΡΠΎΡΠ²Π΅ΡΠΈΠ²Π°ΡΡΠ΅ΠΉ ΡΠ»Π΅ΠΊΡΡΠΎΠ½Π½ΠΎΠΉ ΠΌΠΈΠΊΡΠΎΡΠΊΠΎΠΏΠΈΠΈ ΠΏΡΠΎΠ²Π΅Π΄Π΅Π½ ΡΡΠ°Π²Π½ΠΈΡΠ΅Π»ΡΠ½ΡΠΉ Π°Π½Π°Π»ΠΈΠ· ΡΠΏΠ΅ΡΠΈΠ°Π»ΡΠ½ΡΡ
ΡΡΡΠΊΠΎΠ² Π³ΡΠ°Π½ΠΈΡ Π·Π΅ΡΠ΅Π½ Π² ΠΏΠΎΠ»ΠΈΠΊΡΠΈΡΡΠ°Π»-Π»ΠΈΡΠ΅ΡΠΊΠΈΡ
ΠΏΠ»Π΅Π½ΠΊΠ°Ρ
ΠΊΡΠ΅ΠΌΠ½ΠΈΡ Ρ ΡΠ°Π²Π½ΠΎΠΎΡΠ½ΠΎΠΉ ΠΈ Π΄Π΅Π½Π΄ΡΠΈΡΠ½ΠΎΠΉ ΡΡΡΡΠΊΡΡΡΠΎΠΉ (Π½Π΅Π»Π΅Π³ΠΈΡΠΎΠ²Π°Π½Π½ΡΡ
ΠΈ Π»Π΅Π³ΠΈΡΠΎΠ²Π°Π½Π½ΡΡ
ΡΠΎΡΡΠΎΡΠΎΠΌ), ΠΏΠΎΠ»ΡΡΠ΅Π½Π½ΡΡ
ΠΌΠ΅ΡΠΎΠ΄ΠΎΠΌ Ρ
ΠΈΠΌΠΈΡΠ΅ΡΠΊΠΎΠ³ΠΎ ΠΎΡΠ°ΠΆΠ΄Π΅Π½ΠΈΡ ΠΈΠ· Π³Π°Π·ΠΎΠ²ΠΎΠΉ ΡΠ°Π·Ρ Π² ΡΠ΅Π°ΠΊΡΠΎΡΠ΅ ΠΏΠΎΠ½ΠΈΠΆΠ΅Π½Π½ΠΎΠ³ΠΎ Π΄Π°Π²Π»Π΅Π½ΠΈΡ. Π Π°ΡΡΠΌΠΎΡΡΠ΅Π½Ρ ΠΌΠ΅Ρ
Π°Π½ΠΈΠ·ΠΌΡ ΡΠΎΡΠΌΠΈΡΠΎΠ²Π°Π½ΠΈΡ ΡΠΏΠ΅ΡΠΈΠ°Π»ΡΠ½ΡΡ
ΡΡΡΠΊΠΎΠ² Π² ΠΏΠ»Π΅Π½ΠΊΠ°Ρ
ΡΠ°Π·Π½ΡΡ
ΡΡΡΡΠΊΡΡΡΠ½ΡΡ
ΠΌΠΎΠ΄ΠΈΡΠΈΠΊΠ°ΡΠΈΠΉ. ΠΡΠΎΠ°Π½Π°Π»ΠΈΠ·ΠΈΡΠΎΠ²Π°Π½Π° ΡΠΎΠ»Ρ ΡΠΎΡΡΠΎΡΠ° Π² ΡΠΎΡΠΌΠΈΡΠΎΠ²Π°Π½ΠΈΠΈ ΡΡΡΠΊΠΎΠ² Π³ΡΠ°Π½ΠΈΡ Π·Π΅ΡΠ΅Π½.ΠΠ΅ΡΠΎΠ΄Π°ΠΌΠΈ Π°ΡΠΎΠΌΠ½ΠΎΡ ΡΠΈΠ»ΠΎΠ²ΠΎΡ ΠΌΡΠΊΡΠΎΡΠΊΠΎΠΏΡΡ ΡΠ° ΠΏΡΠΎΡΠ²ΡΡΡΡΡΠΎΡ Π΅Π»Π΅ΠΊΡΡΠΎΠ½Π½ΠΎΡ ΠΌΡΠΊΡΠΎΡΠΊΠΎΠΏΡΡ ΠΏΡΠΎΠ²Π΅Π΄Π΅Π½ΠΎ ΠΏΠΎΡΡΠ²Π½ΡΠ»ΡΠ½ΠΈΠΉ Π°Π½Π°Π»ΡΠ· ΡΠΏΠ΅ΡΡΠ°Π»ΡΠ½ΠΈΡ
ΡΡΠΈΠΊΡΠ² Π³ΡΠ°Π½ΠΈΡΡ Π·Π΅ΡΠ΅Π½ ΡΠ° ΠΏΠΎΠ²Π΅ΡΡ
Π½Π΅Π²ΠΈΡ
Π½Π΅ΠΎΠ΄Π½ΠΎΡΡΠ΄Π½ΠΎΡΡΠ΅ΠΉ Ρ ΠΏΠΎΠ»ΡΠΊΡΠΈΡΡΠ°Π»ΡΡΠ½ΠΈΡ
ΠΏΠ»ΡΠ²ΠΊΠ°Ρ
ΠΊΡΠ΅ΠΌΠ½ΡΡ Π· ΡΡΠ²Π½ΠΎΠΎΡΡΠΎΠ²ΠΎΡ ΡΠ° Π΄Π΅Π½Π΄ΡΠΈΡΠ½ΠΎΡ ΡΡΡΡΠΊΡΡΡΠΎΡ (Π½Π΅Π»Π΅Π³ΠΎΠ²Π°Π½ΠΈΡ
Ρ Π»Π΅Π³ΠΎΠ²Π°Π½ΠΈΡ
ΡΠΎΡΡΠΎΡΠΎΠΌ), ΠΎΡΡΠΈΠΌΠ°Π½ΠΈΡ
ΠΌΠ΅ΡΠΎΠ΄ΠΎΠΌ Ρ
ΡΠΌΡΡΠ½ΠΎΠ³ΠΎ ΠΎΡΠ°Π΄ΠΆΠ΅Π½Π½Ρ Π· Π³Π°Π·ΠΎΠ²ΠΎΡ ΡΠ°Π·ΠΈ Π² ΡΠ΅Π°ΠΊΡΠΎΡΡ Π·Π½ΠΈΠΆΠ΅Π½ΠΎΠ³ΠΎ ΡΠΈΡΠΊΡ. Π ΠΎΠ·Π³Π»ΡΠ½ΡΡΠΎ ΠΌΠ΅Ρ
Π°Π½ΡΠ·ΠΌΠΈ ΡΠΎΡΠΌΡΠ²Π°Π½Π½Ρ ΡΠΏΠ΅ΡΡΠ°Π»ΡΠ½ΠΈΡ
ΡΡΠΈΠΊΡΠ² Ρ ΠΏΠ»ΡΠ²ΠΊΠ°Ρ
ΡΡΠ·Π½ΠΈΡ
ΡΡΡΡΠΊΡΡΡΠ½ΠΈΡ
ΠΌΠΎΠ΄ΠΈΡΡΠΊΠ°ΡΡΠΉ. ΠΡΠΎΠ°Π½Π°Π»ΡΠ·ΠΎΠ²Π°Π½ΠΎ ΡΠΎΠ»Ρ ΡΠΎΡΡΠΎΡΡ Ρ ΡΠΎΡΠΌΡΠ²Π°Π½Π½Ρ ΡΡΠΈΠΊΡΠ² Π³ΡΠ°Π½ΠΈΡΡ Π·Π΅ΡΠ΅Π½
Rotation of Ge ad-dimers on Ge(0 0 1)
Structural calculations of the Ge ad-dimer rotation on Ge(0 0 1)-2Γ1 and Ge(0 0 1)-c(4Γ2) surfaces were performed by ab initio and semiempirical methods. Besides the two (already known) stable adsorption sites on top of the substrate dimer rows (angles between substrate dimer bond and ad-dimer bond are 0Β° and 90Β°, respectively) a new local minimum was found. The angle between the substrate dimer bond and the ad-dimer of this local minimum is about 45Β°. This theoretical result might explain the observation of the so-called A/B Ge ad-dimers on Ge(0 0 1)
La alquibla en al-Andalus y al-Magrib al-AqsΓ‘
Scanning tunneling microscopy has been used to investigate the initial adsorption stage of Bi on Si(1 0 0) and Ge(1 0 0) surfaces at room temperature. The most favorable position for a Bi ad-dimer on both surfaces is the B-configuration (Bi ad-dimer positioned on-top of the substrate rows with its dimer bond aligned along the substrate dimer row direction). For Si(1 0 0) the A-type dimers (dimer bond aligned perpendicular to the substrate dimer row direction) occasionally rotate back and forth to a B-configuration. The diffusion rates of B-type and A-type dimers along the substrate row and the BβA, AβB rotations on Si(1 0 0) are extracted from an analysis of many sequences of STM images. Finally, it is shown that the presence of an attractive interaction between Bi ad-dimers (irrespective of their orientation) positioned on neighboring substrate dimer rows leads to the formation of local regions with a 2Γ2 reconstruction