3,781 research outputs found
Martian impact basins: Morphology differences and tectonic provinces
Detailed geomorphic and structural mapping of five Martian basins and preliminary study of eleven other basins reveal four characteristic styles of modification that relate to the degree and age of past tectonic activity. Within regions that exhibit no evidence for tectonic activity, the modification style can be used to distinguish areas dominated by different exogenic processes. A framework for understanding these different styles of basin modification is provided
Estimating the number of children in England with learning disabilities and whose behaviours challenge
Effect of Buffer Layer and III/V Ratio on the Surface Morphology of GaN Grown by MBE
The surface morphology of GaN is observed by atomic force microscopy for growth on GaN and AlN buffer layers and as a function of III/V flux ratio. Films are grown on sapphire substrates by molecular beam epitaxy using a radio frequency nitrogen plasma source. Growth using GaN buffer layers leads to N-polar films, with surfaces strongly dependent on the flux conditions used. Flat surfaces can be obtained by growing as Ga-rich as possible, although Ga droplets tend to form. Ga-polar films can be grown on AlN buffer layers, with the surface morphology determined by the conditions of buffer layer deposition as well as the III/V ratio for growth of the GaN layer. Near-stoichiometric buffer layer growth conditions appear to support the flattest surfaces in this case. Three defect types are typically observed in GaN films on AlN buffers, including large and small pits and "loop" defects. It is possible to produce surfaces free from large pit defects by growing thicker films under more Ga-rich conditions. In such cases the surface roughness can be reduced to less than 1 nm RMS
Measurement of induced surface charges, contact potentials, and surface states in GaN by electric force microscopy
We have studied molecular beam epitaxy grown GaN films of both polarities using electric force microscopy to detect sub 1 µm regions of charge density variations associated with GaN extended defects. The large piezoelectric coefficients of GaN together with strain introduced by crystalline imperfections produce variations in piezoelectrically induced electric fields around these defects. The consequent spatial rearrangement of charges can be detected by electrostatic force microscopy and was found to be on the order of the characteristic Debye length for GaN at our dopant concentration. The electric force microscope signal was also found to be a linear function of the contact potential between the metal coating on the tip and GaN. Electrostatic analysis yielded a surface state density of 9.4 ± 0.5 × 10^10 cm – 2 at an energy of 30 mV above the valence band indicating that the GaN surface is unpinned in this case
Scanning apertureless microscopy below the diffraction limit: Comparisons between theory and experiment
The exact nature of the signal in scanning apertureless microscopy techniques is the subject of much debate. We have sought to resolve this controversy by carrying out simulations and experiments on the same structures. Simulations of a model of tip–sample coupling are shown to exhibit features that are in agreement with experimental observations at dimensions below the diffraction limit. The simulation of the optical imaging process is carried out using atomic force microscope data as a topographical template and a tip–sample dipole coupling model as the source of optical signal. The simulations show a number of key fingerprints including a dependence on the polarization of the external laser source, the size of the tip, and index of refraction of the sample being imaged. The experimental results are found to be in agreement with many of the features of the simulations. We conclude that the results of the dipole coupling theory agree qualitatively with experimental data and that apertureless microscopy measures optical properties, not just topography
Electron diffusion length and lifetime in p-type GaN
We report on electron beam induced current and current–voltage (I–V) measurements on Schottky diodes on p-type doped GaN layers grown by metal organic chemical vapor deposition. A Schottky barrier height of 0.9 eV was measured for the Ti/Au Schottky contact from the I–V data. A minority carrier diffusion length for electrons of (0.2 ± 0.05) µm was measured for the first time in GaN. This diffusion length corresponds to an electron lifetime of approximately 0.1 ns. We attempted to correlate the measured electron diffusion length and lifetime with several possible recombination mechanisms in GaN and establish connection with electronic and structural properties of GaN
Electric force microscopy of induced charges and surface potentials in GaN modified by light and strain
We have studied molecular beam epitaxy grown GaN films using electric force microscopy to detect sub-1 µm regions of electric field gradient and surface potential variations associated with GaN extended defects. The large piezoelectric coefficients of GaN together with strain introduced by crystalline imperfections produce variation in piezoelectrically induced electric fields around these defects. The consequent spatial rearrangement of charges can be detected by electrostatic force microscopy, and can be additionally modified by externally applied strain and illumination. The electron force microscopy signal was found to be a function of the applied tip bias, showed reversal under externally applied strain, and was sensitive to above band gap illumination
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