Beyond Afro-pessimism and -optimism? A critical discourse analysis of the representation of Africa by alternative news media

Regarding the representation of Africa in western media, academic criticism often refers to the presence of Afro-pessimistic discourses, and more recently to a seemingly emerging Afro-optimistic discourse. However, Scott (2015, 1) points out that a systematic study of Africa’s representation is still missing as most research only includes mainstream media, news genres and formats and thus forms ‘an insufficient basis for reaching any firm, generalisable conclusions’. To address this, we explore the representation of Africa in MO* Magazine, a Belgian alternative news magazine that focuses on the Global South, including an extensive coverage of Africa. Applying Critical Discourse Analysis, we examined all articles covering Africa in 2015 and 2016 in addition to in-depth interviews with editorial staff. The study investigates how MO* constructs its alternative identity in the context of African news coverage. We argue that a mere empirical focus on features and narratives generally attributed to mainstream media, such as the presence of Afro-pessimistic and -optimistic discourses, is not sufficient to reach conclusions about the alternative identity of a magazine. The alternative value of MO* is reflected in the overall focus on the Global South and its key issues, the geographic diversity, editorial approach, and context-richness of the articles

Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

The growth of reactively sputtered TiN films is discussed. First, an overview of the existing models in the literature that describe the development of the orientation and microstructure is given. Then, these models are critically confronted with the results of experiments published in the literature and performed by the authors. The latter experiments focus especially on the determination of the energy flux and atomic N/Ti flux towards the substrate and lead to the conclusion that these fluxes towards the substrate play a key role in the growth of the TiN films. This relation between these fluxes and the microstructure of the TiN films gives further evidence to the previously published extended structure zone model

Deposition of biaxially aligned YSZ layers by dual unbalanced magnetron sputtering

Biaxially aligned YSZ (Yttria Stabilised Zirconia) layers were deposited by unbalanced magnetron sputtering, in a dual magnetron geometry. The unbalanced magnetrons were mounted in such a way that the angle between the target- and substrate normal was 55° for both magnetrons. The target-substrate distance was 13 cm for both magnetrons. A better homogeneity in deposition rate and biaxial alignment was obtained with respect to depositions with one unbalanced magnetron. The YSZ layers were characterized by XRD θ/2θ and (111) pole figures and showed a [001] out-of-plane orientation and a [110] in-plane orientation. The best biaxially aligned YSZ layers obtained so far, showed a FWHM of 21° in (111) pole figures. The influence of the magnet configuration (closed-field or mirror-field) and sputter conditions on the biaxial alignment was investigated. Gauss and Langmuir probe measurements were performed to investigate the influence of the magnet configuration and sputter conditions on the plasma density and the magnetic field lines

biaxial alignment in sputter deposited thin films

Thin films which exhibit a preferential out-of-plane orientation as well as a preferential in-plane orientation are called biaxially aligned. In this work, a magnetron is used to deposit such biaxially aligned and to investigate the underlying mechanism. Understanding the biaxial alignment mechanism, at first compels to understand the development of a preferential out-of-plane orientation. Depending on which of the basic structure forming phenomena can occur, a preferential out-of-plane orientation may develop in an evolutionary way or in a re-structurative way. It is generally accepted that in case of an evolutionary out-of-plane alignment, the crystallographic plane offering the lowest surface mobility to the ad-particles will become the resulting preferential orientation. It is shown that the crystallographic plane which offers the lowest mobility depends on the condition of the reactive gas and on the state of the metallic ad-particles. On the other hand, if the out-of-plane alignment occurs in a re-structurative way, the crystallographic plane with lowest surface energy becomes the resulting preferential orientation. In case that the out-of-plane alignment develops in an evolutionary way, an in-plane alignment can be obtained by tilting the substrate with respect to the material flux. A model for the development of this in-plane alignment is proposed. Basically, the in-plane alignment is a result of a growth rate anisotropy caused by an in-plane orientation dependent material capture length. This material capture length depends on the in-plane orientation since all grains grow according to their kinetically limited growth shape, and because of the directional diffusion of the ad-particles. It is shown that the degree of in-plane alignment is limited by the angular spread on the incoming material flux. Simulating the transport of the sputtered particles through the gas phase, results in the knowledge of this angular spread. Hence, the influence of several deposition parameters on the degree of in-plane alignment could be understood