1 research outputs found
Atmospheric Pressure Chemical Vapour Deposition of Fluorine-doped Tin(IV) Oxide from Fluoroalkyltin Precursors
Perfluoroalkytin compounds R(4-n)Sn(Rf)n (R = Me, Et, Bu, Rf = C4F9, n = 1; R = Bu, Rf =
C4F9, n = 2, 3; R = Bu, Rf = C6F13, n = 1) have been synthesised, characterised by 1H, 13C,
19F and 119Sn NMR and evaluated a precursors for the atmospheric pressure CVD
(APCVD) of F-doped SnO2 thin films. All precursors were sufficiently volatile at in the
range 84 – 136oC and glass substrate temperatures of ca. 550oC to yield high quality
films with ca. 0.79 – 2.02% fluorine incorporation, save for Bu3SnC6F13 which
incorporated < 0.05% fluorine. Films were characterised by XRD, SEM, thickness, haze,
emissivity, sheet resistance. The fastest growth rates and highest quality films were
obtained from Et3SnC4F9. An electron diffraction study of Me3SnC4F9 revealed four
conformations of which only the two of lowest abundance showed close F…Sn
contacts which could plausibly be associated with halogen transfer to tin and in each
case it was fluorine attached to either the γ- or δ-carbon atoms of the Rf chain