11 research outputs found
Effects of ovary storage time on the quality and meiotic competence of cat oocytes
In this study the growth of Si and SiGe layers fabricated by LPCVD epitaxy was investigated with regard to the realization of extended CMOS devices. especially the vertical MOSFET and the n-MODFET. Main focus was the production of thin, threading-dislocation-free relaxed buffer layers which can be used as virtual substrates for strained Si layers. The pursued concept consists of a low-temperature SiGe layer beneath the intrinsic relaxed buffer layer. Optimizing the low-temperature buffer layer the threading dislocation density could be drastically reduced from 1 x 10 to 1 x 10 cm. The second purpose of this study was the investigation of phosphorous-doped ni-layers for vertical MOSFETs. Using germane and a high-temperature desorption step the ni-doping could be reduced immediately after turning off the phosphine flow resulting in an improved doping profile (1430 to 50 nm/Dec.). Based on optimized layers, vertical n-MOSFETs with a channel length of 100 nm and a gate oxide thickness of 10 nm a transconductance of 200 mS/mm. High-frequency measurements resulted in cut-off frequencies of f =8 GHz and f =19 GHz