Evolution of magnetic and microstructural properties of thick sputtered NdFeB films with processing temperature

Ta (100 nm) / NdFeB (5 $\mu$m) / Ta (100 nm) films have been deposited onto Si substrates using triode sputtering (deposition rate ~ 18 $\mu$m/h). A 2-step procedure was used : deposition at temperatures up to 400 C followed by ex-situ annealing at higher temperatures. Post-deposition annealing temperatures above 650 C are needed to develop high values of coercivity. The duration of the annealing time is more critical in anisotropic samples deposited onto heated substrates than in isotropic samples deposited at lower temperatures. For a given set of annealing conditions (750 C/ 10'), high heating rates (≥ 2000 C / h) favour high coercivity in both isotropic and anisotropic films. The shape and size of Nd2Fe14B grains depend strongly on the heating rate

Interaction Domains in High Performance NdFeB Thick Films

International audienceThe magnetic domain structure in sputtered NdFeB thick films has been imaged by magnetic force microscopy. The local texture of the films was investigated by electron backscatter diffraction. The average misorientation of the grains was shown to decrease with increasing substrate temperature during deposition. Interaction domains were observed and are discussed with reference to (i) the sample grain size compared to the single domain particle size and (ii) to sample texture