255 research outputs found
Approches génériques pour calculer le plan de production des procédés d'un smart grid
Two Approaches to Aggregate Smart Grid’s Energy Systems’ Production Plan
International audienc
Towards a generic approach to manage smart grids like any other power plant
International audienc
Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques
The production of defect-free mask blanks remains a key challenge for EUV lithography. Mask-blank inspection tools must be able to accurately detect all critical defects while simultaneously having the minimum possible false-positive detection rate. We have recently observed and here report the identification of bump-type buried substrate defects, that were below the detection limit of a non-actinic (i.e. non-EUV) in inspection tool. Presently, the occurrence inspection of pit-type defects, their printability, and their detectability with actinic techniques and non-actinic commercial tools, has become a significant concern. We believe that the most successful strategy for the development of effective non-actinic mask inspection tools will involve the careful cross-correlation with actinic inspection and lithographic printing. In this way, the true efficacy of prototype inspection tools now under development can be studied quantitatively against relevant benchmarks. To this end we have developed a dual-mode actinic mask inspection system capable of scanning mask blanks for defects (with simultaneous EUV bright-field and dark-field detection) and imaging those same defects with a zoneplate microscope that matches or exceeds the resolution of EUV steppers
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Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements
The production of defect-free mask blanks remains a key challenge for extreme ultraviolet (EUV) lithography. Integral to this effort is the development and characterization of mask inspection tools that are sensitive enough to detect critical defects with high confidence. Using a single programmed-defect mask with a range of buried bump-type defects, we report a comparison of measurements made in four different mask-inspection tools: one commercial tool using 488-nm wavelength illumination, one prototype tool that uses 266-nm illumination, and two non-commercial EUV ''actinic'' inspection tools. The EUV tools include a darkfield imaging microscope and a scanning microscope. Our measurements show improving sensitivity with the shorter wavelength non-EUV tool, down to 33-nm spherical-equivalent-volume diameter, for defects of this type. Measurements conditions were unique to each tool, with the EUV tools operating at a much slower inspection rate. Several defects observed with EUV inspection were below the detection threshold of the non-EUV tools
Performance of actinic EUVL mask imaging using a zoneplate microscope
The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a dual-mode, scanning and imaging extreme-ultraviolet (EUV) microscope designed for pre-commercial EUV mask research. Dramatic improvements in image quality have been made by the replacement of several critical optical elements, and the introduction of scanning illumination to improve uniformity and contrast. We report high quality actinic EUV mask imaging with resolutions as low as 100-nm half-pitch, (20-nm, 5x wafer equivalent size), and an assessment of the imaging performance based on several metrics. Modulation transfer function (MTF) measurements show high contrast imaging for features sizes close to the diffraction-limit. An investigation of the illumination coherence shows that AIT imaging is much more coherent than previously anticipated, with {sigma} below 0.2. Flare measurements with several line-widths show a flare contribution on the order of 2-3% relative intensity in dark regions above the 1.3% absorber reflectivity on the test mask used for these experiments. Astigmatism coupled with focal plane tilt are the dominant aberrations we have observed. The AIT routinely records 250-350 high-quality images in numerous through-focus series per 8-hour shift. Typical exposure times range from 0.5 seconds during alignment, to approximately 20 seconds for high-resolution images
Quantum Imaging with Incoherently Scattered Light from a Free-Electron Laser
The advent of accelerator-driven free-electron lasers (FEL) has opened new
avenues for high-resolution structure determination via diffraction methods
that go far beyond conventional x-ray crystallography methods. These techniques
rely on coherent scattering processes that require the maintenance of
first-order coherence of the radiation field throughout the imaging procedure.
Here we show that higher-order degrees of coherence, displayed in the intensity
correlations of incoherently scattered x-rays from an FEL, can be used to image
two-dimensional objects with a spatial resolution close to or even below the
Abbe limit. This constitutes a new approach towards structure determination
based on incoherent processes, including Compton scattering, fluorescence
emission or wavefront distortions, generally considered detrimental for imaging
applications. Our method is an extension of the landmark intensity correlation
measurements of Hanbury Brown and Twiss to higher than second-order paving the
way towards determination of structure and dynamics of matter in regimes where
coherent imaging methods have intrinsic limitations
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