Influence of Alkali Ions on Tribological Properties of Silicon Surface

Tribological properties of surfaces (friction, adhesion and wear) provide challenging limitations to the design of reliable machines on the micro- and nanometer scale as the surface to volume area increases and volume, mass and inertia of the mobile parts decrease. This study reports on the reduction in the friction force of silicon surfaces after the alkali metal ion exposure in the form of aqueous solutions. A scanning force microscope equipped with a liquid cell was used to investigate the friction force and the pull-off force of a flat silicon surface immersed in water and in different alkali metal chlorides solutions: LiCl, NaCl and CsCl. The concentration ranged from 0.1 up to 1000 µmol/l. The changes in the free surface energy of the initial surface and of the modified surfaces after drying were determined from contact angle measurements and from the acid–base adhesion theory. In both cases, in the liquid environment and after drying of the exposed silicon substrates in air, the friction force is reduced by approximately 50 %. Our results provide new, fundamental insight into the exchange of surface termination layers in particular for tribology. Also it is suggested to use the procedure as a low-cost alternative to improve the tribological properties of the silicon surface in particular in applications where lubricating fluids are not appropriate, e.g., in nanomachines and devices

Enhanced Mechanical, Thermal and Electrical Properties of High-Entropy HfMoNbTaTiVWZr Thin Film Metallic Glass and its Nitrides

The inception of high-entropy alloy promises to push the boundaries for new alloy design with unprecedented properties. This work reports entropy stabilisation of an octonary refractory, HfMoNbTaTiVWZr, high-entropy thin film metallic glass, and derived nitride films. The thin film metallic glass exhibited exceptional ductility of approximate to 60% strain without fracture and compression strength of 3 GPa in micro-compression, due to the presence of high density and strength of bonds. The thin film metallic glass shows thermal stability up to 750 degrees C and resistance to Ar-ion irradiation. Nitriding during film deposition of HfMoNbTaTiVWZr thin film of strong nitride forming refractory elements results in deposition of nanocrystalline nitride films with compressive strength, hardness, and thermal stability of up to 10 GPa, 18.7 GPa, and 950 degrees C, respectively. The high amount of lattice distortion in the nitride films leads to its insulating behaviour with electrical conductivity as low as 200 S cm(-1) in the as-deposited film. The design and exceptional properties of the thin film metallic glass and derived nitride films may open up new avenues of development of bulk metallic glasses and the application of refractory-based high entropy thin films in structural and functional applications