7 research outputs found
Peptide immobilisation on porous silicon surface for metal ions detection
In this work, a Glycyl-Histidyl-Glycyl-Histidine (GlyHisGlyHis) peptide is covalently anchored to the porous silicon PSi surface using a multi-step reaction scheme compatible with the mild conditions required for preserving the probe activity. In a first step, alkene precursors are grafted onto the hydrogenated PSi surface using the hydrosilylation route, allowing for the formation of a carboxyl-terminated monolayer which is activated by reaction with N-hydroxysuccinimide in the presence of a peptide-coupling carbodiimide N-ethyl-N'-(3-dimethylaminopropyl)-carbodiimide and subsequently reacted with the amino linker of the peptide to form a covalent amide bond. Infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy are used to investigate the different steps of functionalization
4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography
In this work, we report a method to process porous silicon to improve
its chemical resistance to alkaline solution attacks based on the
functionalization of the pore surface by the electrochemical reduction
of 4-nitrobenzendiazonium salt. This method provides porous silicon with
strong resistance to the etching solutions used in optical lithography
and allows the fabrication of tailored metallic contacts on its surface.
The samples were studied by chemical, electrochemical, and morphological
methods. We demonstrate that the grafted samples show a resistance to
harsh alkaline solution more than three orders of magnitude larger than
that of pristine porous silicon, being mostly unmodified after about 40
min. The samples maintained open pores after the grafting, making them
suitable for further treatments like filling by polymers. Optical
lithography was performed on the functionalized samples, and
electrochemical characterization results are shown.In this work, we report a method to process porous silicon to improve
its chemical resistance to alkaline solution attacks based on the
functionalization of the pore surface by the electrochemical reduction
of 4-nitrobenzendiazonium salt. This method provides porous silicon with
strong resistance to the etching solutions used in optical lithography
and allows the fabrication of tailored metallic contacts on its surface.
The samples were studied by chemical, electrochemical, and morphological
methods. We demonstrate that the grafted samples show a resistance to
harsh alkaline solution more than three orders of magnitude larger than
that of pristine porous silicon, being mostly unmodified after about 40
min. The samples maintained open pores after the grafting, making them
suitable for further treatments like filling by polymers. Optical
lithography was performed on the functionalized samples, and
electrochemical characterization results are shown