Native point defects in GaSb

We have applied positron annihilation spectroscopy to study native point defects in Te-doped n-type and nominally undoped p-type GaSb single crystals. The results show that the dominant vacancy defect trapping positrons in bulk GaSb is the gallium monovacancy. The temperature dependence of the average positron lifetime in both p- and n-type GaSb indicates that negative ion type defects with no associated open volume compete with the Ga vacancies. Based on comparison with theoretical predictions, these negative ions are identified as Ga antisites. The concentrations of these negatively charged defects exceed the Ga vacancy concentrations nearly by an order of magnitude. We conclude that the Ga antisite is the native defect responsible for p-type conductivity in GaSb single crystals.Peer reviewe

Instability of the Sb vacancy in GaSb

We demonstrate that the instability of the Sb vacancy in GaSb leads to a further increase in the acceptor-type defect concentration in proton irradiated undoped, p-type GaSb. Using positron annihilation spectroscopy in situ with 10 MeV proton irradiation at 35 K, we find that the irradiation produces both native vacancy defects in GaSb. However, the Sb vacancy is unstable above temperatures of 150 K and undergoes a transition resulting in a Ga vacancy and a Ga antisite. The activation energy of this transition is determined to be 0.6 eV +/- 0.1 eV. Our results are in line with the established amphoteric defect model and prove that the instability of the Sb vacancy in GaSb has a profound role on the native defect concentration in GaSb.Peer reviewe

Point defect balance in epitaxial GaSb

Positron annihilation spectroscopy in both conventional and coincidence Doppler broadening mode is used for studying the effect of growth conditions on the point defect balance in GaSb:Bi epitaxial layers grown by molecular beam epitaxy. Positron annihilation characteristics in GaSb are also calculated using density functional theory and compared to experimental results. We conclude that while the main positron trapping defect in bulk samples is the Ga antisite, the Ga vacancy is the most prominent trap in the samples grown by molecular beam epitaxy. The results suggest that the p–type conductivity is caused by different defects in GaSb grown with different methods.Peer reviewe

Hole density and acceptor-type defects in MBE-grown GaSb1-x Bi x

We study acceptor-type defects in GaSb1−xBix grown by molecular beam epitaxy. The hole density of the GaSb1−xBix layers, from capacitance-voltage measurements of Schottky diodes, is higher than that of the binary alloys and increases linearly up to 1019 − cm 3 with the Bi content. Positron annihilation spectroscopy and ab initio calculations show that both Ga vacancies and Ga antisites contribute to the hole density and that the proportion of the two acceptor-type defects vary in the layers. The modification of the band gap due to Bi incorporation as well as the growth parameters are suggested to affect the concentrations of acceptor-type defects

Increased p-type conductivity in GaNxSb1−x, experimental and theoretical aspects

The large increase in the p-type conductivity observed when nitrogen is added to GaSb has been studied using positron annihilation spectroscopy and ab initio calculations. Doppler broadening measurements have been conducted on samples of GaN x Sb 1− x layers grown by molecular beam epitaxy, and the results have been compared with calculated first-principle results corresponding to different defect structures. From the calculated data, binding energies for nitrogen-related defects have also been estimated. Based on the results, the increase in residual hole concentration is explained by an increase in the fraction of negative acceptor-type defects in the material. As the band gap decreases with increasing N concentration, the ionization levels of the defects move closer to the valence band. Ga vacancy-type defects are found to act as positron trapping defects in the material, and the ratio of Ga vacancy-type defects to Ga antisites is found to be higher than that of the p-type bulk GaSb substrate. Beside Ga vacancies, the calculated results imply that complexes of a Ga vacancy and nitrogen could be present in the material

Defect studies in MBE grown GaSbBi layers

Gallium antimonide is an interesting material both from a material and a device point of view. Thedirect, narrow band gap and high electron mobility makes the compound semiconductor a suitablecandidate for high speed electronics and optoelectric devices. It can also be used as a substratematerial for other ternary or quaternary III–V compounds whose band gaps cover a wide spectralrange from 0.8 to 4.3 \u10021dm. [1]Incorporating Bi into GaSb has shown to have several advantages compared to, for example, GaNSb.Not only is the band gap reduced [2], but the width of the gap depends very weakly on temperature [3]and the electron mobility is higher than that of GaNSb [4]. The spin-orbit splitting is also larger thanthe actual band gap which could be used for suppressing Auger-recombinations [5].Using positron annihilation spectroscopy (PAS) in Doppler broadening mode, we have studiedsamples of GaSbBi epitaxial layers on GaSb substrates. The PAS technique is based on the interactionbetween positrons and electrons in solids and can be used for e.g. vacancy defect characterization inthin layers. The studied samples were MBE-grown and the main varied growth parameter wastemperature, which lead to different Bi concentrations. The Bi concentrations were 0 - 0.7 %, theepitaxial layer thickness was 200 nm. The substrate was Te-doped (n-type) GaSb.From the measured results, differences between the samples grown under different conditions can beclearly observed. A short diffusion length for the positrons is observed in all of the epitaxial layers,which indicates an increase in positron trapping defects in the layers, compared to the substrate.Furthermore, the Doppler broadening annihilation parameters in the epitaxial layers also seem todepend on the growth temperature and hence, also on the Bi concentration. In order to be able todistinguish the influence of the Bi concentration from the influence of vacancy defects on the Dopplerbroadening parameters, more accurate measurements need to be conducted. We hope to achieve abetter understanding of the positron trapping defect in the epitaxial layers by using coincidenceDoppler broadening

Defect studies in MBE grown GaSb1-x Bi x layers

Positron annihilation spectroscopy in Doppler broadening mode is used to study epitaxial layers of GaSb 1-x Bi x on undoped GaSb. The samples were grown by Molecular Beam Epitaxy at different temperatures and with different Bi/Sb beam equivalent pressure ratios resulting in Bi concentrations of 0-0.7 %. The results show a relationship between the growth parameters and Doppler broadening parameters. Incorporating Bi into GaSb decreases the vacancy concentration in the epitaxial layers compared to the sample with no Bi in the epitaxial layer