15 research outputs found

    Monolithic integration of broadband optical isolators for polarization-diverse silicon photonics

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    Integrated optical isolators have been a longstanding challenge for photonic integrated circuits (PIC). An ideal integrated optical isolator for PIC should be made by a monolithic process, have a small footprint, exhibit broadband and polarization-diverse operation, and be compatible with multiple materials platforms. Despite significant progress, the optical isolators reported so far do not meet all these requirements. In this article we present monolithically integrated broadband magneto-optical isolators on silicon and silicon nitride (SiN) platforms operating for both TE and TM modes with record high performances, fulfilling all the essential characteristics for PIC applications. In particular, we demonstrate fully-TE broadband isolators by depositing high quality magneto-optical garnet thin films on the sidewalls of Si and SiN waveguides, a critical result for applications in TE-polarized on-chip lasers and amplifiers. This work demonstrates monolithic integration of high performance optical isolators on chip for polarization-diverse silicon photonic systems, enabling new pathways to impart nonreciprocal photonic functionality to a variety of integrated photonic devices

    1.3  μm submilliamp threshold quantum dot micro-lasers on Si

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    As a promising integration platform, silicon photonics need on-chip laser sources that dramatically improve capability, while trimming size and power dissipation in a cost-effective way for volume manufacturability. Currently, direct heteroepitaxial growth of III–V laser structures on Si using quantum dots as the active region is a vibrant field of research, with the potential to demonstrate low-cost, high-yield, long-lifetime, and high-temperature devices. Ongoing work is being conducted to reduce the power consumption, maximize the operating temperature, and switch from miscut Si substrates toward the so-called exact (001) Si substrates that are standard in microelectronics fabrication. Here, we demonstrate record-small electrically pumped micro-lasers epitaxially grown on industry standard (001) silicon substrates. Continuous-wave lasing up to 100°C was demonstrated at 1.3 μm communication wavelength. A submilliamp threshold of 0.6 mA was achieved for a micro-laser with a radius of 5 μm. The thresholds and footprints are orders of magnitude smaller than those previously reported lasers epitaxially grown on Si

    Electro-luminescent cooling: light emitting diodes above unity efficiency

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    Experimental demonstration of net electro-luminescent cooling in a diode, or equivalently electroluminescence with wall-plug efficiency greater than unity, had eluded direct observation for more than five decades. We review experiments demonstrating light emission from a light-emitting diode in which the electron population is pumped by a combination of electrical work and heat

    A Sub-Picojoule per Bit Integrated Magneto-Optic Modulator on Silicon: Modeling and Experimental Demonstration

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    Integrated magneto-optic (MO) modulators are an attractive but not fully explored alternative to electro-optic (EO) modulators. They are current driven, structurally simple, and could potentially achieve high efficiency in cryogenic and room temperature environments where fJ bit−1 optical interfaces are needed. In this paper, the performance and energy efficiency of a novel MO modulator at room temperature are for the first time assessed. First, a model of the micro-ring-based modulator is implemented to investigate the design parameters and their influence on the performance. Then, a fabricated device is experimentally characterized to assess its performance in terms of bit rate and energy efficiency. The model shows efficient operation at 1.2 Gbps using a 16 mA drive current, consuming only 155 fJ bit−1. The experimental results show that the MO effect is suitable for modulation, achieving error-free operation above 16 mA with a power consumption of 258 fJ bit−1 at a transient limited data rate of 1.2 Gbps

    Ultra-Low-Loss Silicon Waveguides for Heterogeneously Integrated Silicon/III-V Photonics

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    Integrated ultra-low-loss waveguides are highly desired for integrated photonics to enable applications that require long delay lines, high-Q resonators, narrow filters, etc. Here, we present an ultra-low-loss silicon waveguide on 500 nm thick Silicon-On-Insulator (SOI) platform. Meter-scale delay lines, million-Q resonators and tens of picometer bandwidth grating filters are experimentally demonstrated. We design a low-loss low-reflection taper to seamlessly integrate the ultra-low-loss waveguide with standard heterogeneous Si/III-V integrated photonics platform to allow realization of high-performance photonic devices such as ultra-low-noise lasers and optical gyroscopes

    Ring-Resonator Based Widely-Tunable Narrow-Linewidth Si/InP Integrated Lasers

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