1,302 research outputs found
Flux dependent 1.5 MeV self-ion beam induced sputtering from Gold nanostructured thin films
We discuss four important aspects of 1.5 MeV Au2+ ion-induced flux dependent
sputtering from gold nanostrcutures (of an average size 7.6 nm and height 6.9
nm) that are deposited on silicon substrates: (a) Au sputtering yield at the
ion flux of 6.3x10^12 ions cm-2 s-1 is found to be 312 atoms/ion which is about
five times the sputtering yield reported earlier under identical irradiation
conditions at a lower beam flux of 10^9 ions cm-2 s-1, (b) the sputtered yield
increases with increasing flux at lower fluence and reduces at higher fluence
(1.0x10^15 ions cm-2) for nanostructured thin films while the sputtering yield
increases with increasing flux and fluence for thick films (27.5 nm Au
deposited on Si) (c) Size distribution of sputtered particles has been found to
vary with the incident beam flux showing a bimodal distribution at higher flux
and (d) the decay exponent obtained from the size distributions of sputtered
particles showed an inverse power law dependence ranging from 1.5 to 2.5 as a
function of incident beam flux. The exponent values have been compared with
existing theoretical models to understand the underlying mechanism. The role of
wafer temperature associated with the beam flux has been invoked for a
qualitative understanding of the sputtering results in both the nanostructured
thin films and thick films.Comment: 25 pages, 5 figures, 1 table To be Appeared in J. Phys. D: Appl. Phy
Ion beam induced enhanced diffusion from gold thin films in silicon
Enhanced diffusion of gold atoms into silicon substrate has been studied in
Au thin films of various thicknesses (2.0, 5.3, 10.9 and 27.5 nm) deposited on
Si(111) and followed by irradiation with 1.5 MeV Au2+ at a flux of 6.3x10^12
ions cm-2 s-1 and fluence up to 1x10^15 ions cm-2. The high resolution
transmission electron microscopy measurements showed the presence of gold
silicide formation for the above-mentioned systems at fluence greater than
equal to 1x1014 ions cm-2. The maximum depth to which the gold atoms have been
diffused at a fluence of 1x10^14 ions cm-2 for the cases of 2.0, 5.3, 10.9 and
27.5 nm thick films has been found to be 60, 95, 160 and 13 nm respectively.
Interestingly, at higher fluence of 1x1015 ions cm-2 in case of 27.5 nm thick
film, gold atoms from the film transported to a maximum depth of 265 nm in the
substrate. The substrate silicon is found to be amorphous at the above fluence
values where unusually large mass transport occurred. Enhanced diffusion has
been explained on the basis of ion beam induced, flux dependent amorphous
nature of the substrate, and transient beam induced temperature effects. This
work confirms the absence of confinement effects that arise from spatially
confined structures and existence of thermal and chemical reactions during ion
irradiation.Comment: 15 pages, 3 figure
Peeling from a patterned thin elastic film
Inspired by the observation that many naturally occurring adhesives arise as
textured thin films, we consider the displacement controlled peeling of a
flexible plate from an incision-patterned thin adhesive elastic layer. We find
that crack initiation from an incision on the film occurs at a load much higher
than that required to propagate it on a smooth adhesive surface; multiple
incisions thus cause the crack to propagate intermittently. Microscopically,
this mode of crack initiation and propagation in geometrically confined thin
adhesive films is related to the nucleation of cavitation bubbles behind the
incision which must grow and coalesce before a viable crack propagates. Our
theoretical analysis allows us to rationalize these experimental observations
qualitatively and quantitatively and suggests a simple design criterion for
increasing the interfacial fracture toughness of adhesive films.Comment: 8 pages, To appear in Proceedings of Royal Society London, Ser.
Size distribution of sputtered particles from Au nanoislands due to MeV self-ion bombardment
Nanoisland gold films, deposited by vacuum evaporation of gold onto Si(100)
substrates, were irradiated with 1.5 MeV Au ions up to a fluence of
ions cm and at incidence angles up to
with respect to the surface normal. The sputtered particles were collected on
carbon coated grids (catcher grid) during ion irradiation and were analyzed
with transmission electron microscopy and Rutherford backscattering
spectrometry. The average sputtered particle size and the areal coverage are
determined from transmission electron microscopy measurements, whereas the
amount of gold on the substrate is found by Rutherford backscattering
spectrometry. The size distributions of larger particles (number of
atoms/particle, 1,000) show an inverse power-law with an exponent of
-1 in broad agreement with a molecular dynamics simulation of ion impact
on cluster targets.Comment: 13 pages, 8 figures, Submitted for publication in JA
Investigating the Barriers to Quality 4.0 Adoption in the Indian Manufacturing Sector: Insights and Implications for Industry and Policymaking
Purpose: The research explores the shift to Quality 4.0, examining the move towards a data-focused transformation within organizational frameworks. This transition is characterized by incorporating Industry 4.0 technological innovations into existing quality management frameworks, signifying a significant evolution in quality control systems. Despite the evident advantages, the practical deployment in the Indian manufacturing sector encounters various obstacles. This research is dedicated to a thorough examination of these impediments. It is structured around a set of pivotal research questions: Firstly, it seeks to identify the key barriers that impede the adoption of Quality 4.0. Secondly, it aims to elucidate these barriers' interrelations and mutual dependencies. Thirdly, the research prioritizes these barriers in terms of their significance to the adoption process. Finally, it contemplates the ramifications of these priorities for the strategic advancement of manufacturing practices and the development of informed policies. By answering these questions, the research provides a detailed understanding of the challenges faced. It offers actionable insights for practitioners and policymakers implementing Quality 4.0 in the Indian manufacturing sector.
Design/methodology/approach: Employing Interpretive Structural Modelling (ISM) and Matrix Impact of Cross Multiplication Applied to Classification (MICMAC), we probe the interdependencies amongst fourteen identified barriers inhibiting Quality 4.0 adoption. These barriers were categorised according to their driving power and dependence, providing a richer understanding of the dynamic obstacles within the Technology-Organization-Environment (TOE) framework.
Findings: The study results highlight the lack of Quality 4.0 standards and Big Data Analytics (BDA) tools as fundamental obstacles to integrating Quality 4.0 within the Indian manufacturing sector. Additionally, the study results contravene dominant academic narratives, suggesting that the cumulative impact of organisational barriers is marginal, contrary to theoretical postulations emphasising their central significance in Quality 4.0 assimilation.
Originality: This research delineates specific obstacles to Quality 4.0 adoption by applying the TOE (Technology-Organization-Environment) framework, detailing how these barriers interact with and influence each other, particularly highlighting the previously overlooked environmental factors. The analysis reveals a critical interdependence between 'Lack of standards for Quality 4.0' and 'Lack of standardised Big Data Analytics (BDA) tools and solutions', providing nuanced insights into their conjoined effect on stalling progress in this field. Moreover, the study contributes to the theoretical body of knowledge by mapping out these novel impediments, offering a more comprehensive understanding of the challenges faced in adopting Quality 4.0.
Practical implications: This research provides concrete strategies, such as developing a collaborative platform for sharing best practices in Quality 4.0 standards, which fosters a synergistic relationship between organizations and policymakers, for instance, by creating a joint task force, comprised of industry leaders and regulatory bodies, dedicated to formulating and disseminating comprehensive guidelines for Quality 4.0 adoption. This initiative could lead to establishing industry-wide standards, benefiting from the pooled expertise of diverse stakeholders. Additionally, the study underscores the necessity for robust, standardized Big Data Analytics tools specifically designed to meet the Quality 4.0 criteria, which can be developed through public-private partnerships. These tools would facilitate the seamless integration of Quality 4.0 processes, demonstrating a direct route for overcoming the barriers of inadequate standards
Novel Bacterial Diversity and Fragmented eDNA Identified in Hyperbiofilm-Forming Pseudomonas aeruginosa Rugose Small Colony Variant
Pseudomonas aeruginosa biofilms represent a major threat to health care. Rugose small colony variants (RSCV) of P. aeruginosa, isolated from chronic infections, display hyperbiofilm phenotype. RSCV biofilms are highly resistant to antibiotics and host defenses. This work shows that RSCV biofilm aggregates consist of two distinct bacterial subpopulations that are uniquely organized displaying contrasting physiological characteristics. Compared with that of PAO1, the extracellular polymeric substance of RSCV PAO1ΔwspF biofilms presented unique ultrastructural characteristics. Unlike PAO1, PAO1ΔwspF released fragmented extracellular DNA (eDNA) from live cells. Fragmented eDNA, thus released, was responsible for resistance of PAO1ΔwspF biofilm to disruption by DNaseI. When added to PAO1, such fragmented eDNA enhanced biofilm formation. Disruption of PAO1ΔwspF biofilm was achieved by aurine tricarboxylic acid, an inhibitor of DNA-protein interaction. This work provides critical novel insights into the contrasting structural and functional characteristics of a hyperbiofilm-forming clinical bacterial variant relative to its own wild-type strain
Demonstration of fundamental mode only propagation in highly multimode fibre for high power EDFAs
The use of short lengths of large core phosphate glass fibre, doped with high
concentrations of Er or Er:Yb represents an attractive route to achieving high
power erbium doped fibre amplifiers (EDFAs) and lasers (EDFLs). With the aim of
investigating the potential of achieving diffraction limited output from such
large core fibres, we present experimental results of fundamental mode
propagation through a 20 cm length of passive 300 micrometer core multimode
fibre when the input is a well-aligned Gaussian beam. Through careful control
of fibre geometry, input beam parameters and alignment, we measured an output M
squared of 1.1 + - 0.05. The fibre had a numerical aperture of 0.389, implying
a V number of 236.8. To our knowledge, this is the largest core fibre through
which diffraction limited fundamental mode propagation has been demonstrated.
Although the results presented here relate to undoped fibre, they do provide
the practical basis for a new generation of EDFAs and EDFLs.Comment: 5 figure
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