Rapid thermal processing of Czochralski silicon substrates: Defects, denuded zones, and minority carrier lifetime

Rapid thermal processing (RTP) of Czochralski (Cz) silicon substrates is discussed with its attendant effects on defects, denuded zones, and minority carrier lifetime. Preferential chemical etching and X-ray topography was used to delineate defects which were subsequently correlated with minority carrier lifetime; determined by a pulse metallo-organic decompositon (MOD) test device. The X-ray delineation of grown-in defects was enhanced by a lithium decoration procedure. Results, thus far, show excellent correlation between process-induced defects

Electron Beam Induced Current Studies of Defect Induced Conductivity Inversion

Defect induced inversion of conductivity type was studied both at the surface and at a network of interfacially confined misfit dislocations in heteroepitaxial Si(Ge) on Si structures. The inversion was achieved by controlled contamination with Au and Ni metallic impurities introduced by diffusion from backside evaporated layers. A theoretical explanation of the defect electrical activity and the inversion effect is presented, along with temperature dependent beam induced current observations