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- 'The Optical Society'
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- 01/01/2017
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Session: Novel Computational Imaging (CW1B)This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model. It is expected that the approach can improve the robustness of the photomask evaluated by MEEF. © 2017 OS
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- Publication venue
- 'Springer Science and Business Media LLC'
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- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
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- Publication venue
- 'Springer Science and Business Media LLC'
- Publication date
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- Publication venue
- 'Springer Science and Business Media LLC'
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- Field of study