188 research outputs found

    Acoustic Microscopy Via Scanning

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    We offer via posters some of the latest images recorded with the scanning acoustic microscope operating near 2.5 GHz. Our report at the 1978 Review included a description of the scanning instrument which had been scaled up in frequency to 3 GHz. This was accomplished in large part by fabricating acoustic lens with smaller radii and by heating the liquid to reduce the absorption. In our report for this year, we·will present the results of our material studies as carried out with the new instruments operating near 2.5 GHz. We will include results on four different materials - steel, Cobalt-Titanium, brass and alumina ceramic. Each of these have distinctive characteristics in the acoustic micrographs and each of these have information which is distinct from their optical counterparts

    Modeling the effect of subsurface interface defects on contact stiffness for ultrasonic atomic force microscopy

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    Cataloged from PDF version of article.We present a model predicting the effects of mechanical defects at layer interfaces on the contact stiffness measured by ultrasonicatomic force microscopy(AFM). Defects at subsurface interfaces result in changes at the local contact stiffness between the AFM tip and the sample. Surface impedance method is employed to model the imperfections and an iterative algorithm is used to calculate the AFM tip-surface contact stiffness. The sensitivity of AFM to voids or delaminations and disbonds is investigated for film-substrate combinations commonly used in microelectronic structures, and optimum defect depth for maximum sensitivity is defined. The effect of contact force and the tip properties on the defect sensitivity are considered. The results indicate that the ultrasonicAFM should be suitable for subsurface detection and its defect sensitivity can be enhanced by adjusting the applied force as well as by judicious choice of the AFM tip material and geometry. © 2004 American Institute of Physic

    Acoustic Microscopy for Materials Characterization

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    An acoustic microscope with mechanical scanning and piezoelectric film transducers for the input and output has been developed for the microscopic examination of materials.1 In the reflection mode it is possible to work with an acoustic wavelength of 0.5 micrometers and a resolution that compares to that of the optical microscope. The elastic images of material surfaces as recorded with this instrument display interesting features which provide information which complements the optical microscope. In particular we find that different phases show up with good contrast and in alloy material the texture of the grains can be recorded since the grain orientation influences the acoustic reflectivity

    Micromachinable ultrasonic leaky wave air transducers

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    Cataloged from PDF version of article.Ultrasonic air transducers using leaky waves on thin membranes are analyzed using perturbation and normal mode approaches. The transducers utilize the efficient coupling of ultrasonic energy to air through radiation of these leaky wave modes when their phase velocity is close to the sound speed in air. Theoretical results on optimum transducer dimensions and bandwidth estimation show that a minimum conversion loss of 8.7 dB with a 78% fractional bandwidth is possible. Common micromachining materials are shown to be suitable transducer materials and result in feasible devices. This is demonstrated by fabricating a 580 kHz transducer using a silicon membrane bonded to a ring of PZT-5H. With this configuration the transducer is self line focusing. Results of through transmission experiments on silicon and transmission images on paper are reported. © 1998 American Institute of Physic

    Resonant harmonic response in tapping-mode atomic force microscopy

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    Cataloged from PDF version of article.Higher harmonics in tapping-mode atomic force microscopy offers the potential for imaging and sensing material properties at the nanoscale. The signal level at a given harmonic of the fundamental mode can be enhanced if the cantilever is designed in such a way that the frequency of one of the higher harmonics of the fundamental mode ~designated as the resonant harmonic! matches the resonant frequency of a higher-order flexural mode. Here we present an analytical approach that relates the amplitude and phase of the cantilever vibration at the frequency of the resonant harmonic to the elastic modulus of the sample. The resonant harmonic response is optimized for different samples with a proper design of the cantilever. It is found that resonant harmonics are sensitive to the stiffness of the material under investigation

    Nanometer-scale patterning and individual current-controlled lithography using multiple scanning probes

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    Cataloged from PDF version of article.Scanning probe lithography(SPL) is capable of sub-30-nm-patterning resolution and nanometer-scale alignment registration, suggesting it might provide a solution to the semiconductor industry’s lithography challenges. However, SPL throughput is significantly lower than conventional lithography techniques. Low throughput most limits the widespread use of SPL for high resolution patterning applications. This article addresses the speed constraints for reliable patterning of organic resists. Electrons field emitted from a sharp probe tip are used to expose the resist. Finite tip-sample capacitance limits the bandwidth of current-controlled lithography in which the tip-sample voltage bias is varied to maintain a fixed emission current during exposure. We have introduced a capacitance compensation scheme to ensure continuous resist exposure of SAL601 polymerresist at scan speeds up to 1 mm/s. We also demonstrate parallel resist exposure with two tips, where the emission current from each tip is individually controlled. Simultaneous patterning with multiple tips may make SPL a viable technology for high resolution lithography. © 1999 American Institute of Physic

    Interdigital cantilevers for atomic force microscopy

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    Cataloged from PDF version of article.We present a sensor for the atomic force microscope(AFM) where a silicon cantilever is micromachined into the shape of interdigitated fingers that form a diffraction grating. When detecting a force, alternating fingers are displaced while remaining fingers are held fixed. This creates a phase sensitive diffraction grating, allowing the cantilever displacement to be determined by measuring the intensity of diffracted modes. This cantilever can be used with a standard AFM without modification while achieving the sensitivity of the interferometer and maintaining the simplicity of the optical lever. Since optical interference occurs between alternating fingers that are fabricated on the cantilever, laser intensity rather than position can be measured by crudely positioning a photodiode. We estimate that the rms noise of this sensor in a 10 hz–1 kHz bandwidth is ∼0.02 Å and present images of graphite with atomic resolution. © 1996 American Institute of Physic

    Independent parallel lithography using the atomic force microscope

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    Cataloged from PDF version of article.Independent parallel features have been lithographically patterned with a 2×1 array of individually controlled cantilevers using an atomic force microscope. Control of the individual cantilevers was achieved with an integrated piezoelectric actuator in feedback with a piezoresistivesensor. Patterns were formed on 〈100〉 single crystalsilicon by using a computer controlled tip voltage to locally enhance the oxidation of the silicon. Using the piezoresistor directly as a force sensor, parallel images can be simultaneously acquired in the constant force mode. A discussion of electrostatic forces due to applied tip voltages, hysteresis characteristics of the actuator, and the cantilever system is also presented. © 1996 American Vacuum Societ

    Analysis and design of interdigital cantilever as a displacement sensor

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    Cataloged from PDF version of article.The interdigital ~ID! cantilever with two sets of interleaving fingers is an alternative to the conventional cantilever used in the atomic force microscope ~AFM!. In this paper we present a detailed analysis of the interdigital cantilever and its use as a sensor for the AFM. In this study, we combine finite element analysis with diffraction theory to simulate the mechanically induced optical response of the ID. This model is used to compare this system with the optical lever detector as used in conventional instruments by analyzing the ratio of signal to noise and overall performance. We find that optical detection of the cantilever motion with interdigital fingers has two advantages. When used in conjunction with arrays of cantilevers it is far easier to align. More importantly, it is immune to laser pointing noise and thermally excited mechanical vibrations and this improves the sensitivity as compared to the optical lever. © 1998 American Institute of Physics
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