63 research outputs found
Pulse Propagation in Resonant Tunneling
We consider the analytically solvable model of a Gaussian pulse tunneling
through a transmission resonance with a Breit-Wigner characteristic. The
solution allows for the identification of two opposite pulse propagation
regimes: if the resonance is broad compared to the energetic width of the
incident Gaussian pulse a weakly deformed and slightly delayed transmitted
Gaussian pulse is found. In the opposite limit of a narrow resonance the dying
out of the transmitted pulse is dominated by the slow exponential decay
characteristic of a quasi-bound state with a long life time (decaying state).
We discuss the limitation of the achievable pulse transfer rate resulting from
the slow decay. Finally, it is demonstrated that for narrow resonances a small
second component is superimposed to the exponential decay which leads to
characteristic interference oscillations.Comment: 6 pages, 4 figure
Kondo effect in quantum dots
We review mechanisms of low-temperature electronic transport through a
quantum dot weakly coupled to two conducting leads. Transport in this case is
dominated by electron-electron interaction. At temperatures moderately lower
than the charging energy of the dot, the linear conductance is suppressed by
the Coulomb blockade. Upon further lowering of the temperature, however, the
conductance may start to increase again due to the Kondo effect. We concentrate
on lateral quantum dot systems and discuss the conductance in a broad
temperature range, which includes the Kondo regime
Optical and EUV projection lithography: A computational view
This article reviews modeling approaches for optical and extreme ultraviolet (EUV) projection lithography. It explains the models for the rigorous computation of light diffraction from lithographic masks, a vector formulation of image formation in projection scanners and models for chemical amplified resists (CAR). Several examples demonstrate the application of these models and related computation techniques. It is shown how computational lithography supports innovative optics and material-driven resolution enhancement solutions but also how it helps to comprehend and master the lithographic process
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