Latent image diffraction from submicron photoresist gratings

Light scattering from latent images in photoresist is useful for lithographic tool characterization, process monitoring, and process control. In particular, closed‐loop control of lithographic processes is critical for high yield, low cost device manufacturing. In this work, we report use of pulsed laser diffraction from photoresist latent images in 0.24 μm pitch distributed feedback laser gratings. Gated detection of pulsed light scattering permits high spatial resolution probing using ultraviolet light without altering the latent image. A correlation between latent image and etched grating diffraction efficiencies is demonstrated and shows the value of "upstream" monitoring

Ammonia plasma passivation of GaAs in downstream microwave and radio-frequency parallel plate plasma reactors

The poor electronic properties of the GaAs surface and GaAs–insulator interfaces, generally resulting from large density of surface/interface states, have limited GaAs device technology. Room-temperature ammonia plasma (dry) passivation of GaAs surfaces, which reduces the surface state density, is investigated as an alternative to wet passivation techniques. Plasma passivation is more compatible with clustered-dry processing which provides better control of the processing environment, and thus, improves interface integrity. Passivation was monitored in real-time and in situ using photoluminescence (PL). In addition, the passivated surfaces are inspected using x-ray photoelectron spectroscopy. Passivation with two different plasma excitation methods, downstream microwave (2.45 GHz) and rf (13.56 MHz) parallel plate, are compared, and effects of operating parameters such as pressure, flow rate, and power are examined. In both methods plasma-generated H atoms reduce the surface state density by removing excess As and As2O3 during the first few seconds of the plasma exposure. This step is followed by formation of Ga2O3 which takes place on a longer time scale (5–10 min). While the final passivation result appears to be similar for both methods, surface damage by ion bombardment competes with passivation in the parallel plate method, reduces the PL yield and adversely affects the long term stability of the passivated surface. Although it is common to heat the sample during passivation, we show that NH3 plasma passivation is possible at room temperature without heating. Low-temperature processing is important since passivation can be done at the end of device processing when it is undesirable to expose the device to elevated temperatures. The absence of ion bombardment damage combined with efficient generation of H atoms in the downstream microwave treatment, make this scheme a preferred dry passivation process, which could be easily and inexpensively clustered with existing GaAs processes

Violet-light spontaneous and stimulated emission from ultrathin In-rich InGaN/GaN multiple quantum wells grown by metalorganic chemical vapor deposition

We investigated the spontaneous and stimulated emission properties of violet-light-emitting ultrathin In-rich InGaN/GaN multiple quantum wells (MQWs) with indium content of 60%-70%. The Stokes shift was smaller than that of In-poor InGaN MQWs, and the emission peak position at 3.196 eV was kept constant with increasing pumping power, indicating negligible quantum confined Stark effect in ultrathin In-rich InGaN MQWs despite of high indium content. Optically pumped stimulated emission performed at room temperature was observed at 3.21 eV, the high-energy side of spontaneous emission, when the pumping power density exceeds ???31 kW/ cm2.open6

In-rich InGaN/GaN quantum wells grown by metal-organic chemical vapor deposition

Growth mechanism of In-rich InGaN/GaN quantum wells (QWs) was investigated. First, we examined the initial stage of InN growth on GaN template considering strain-relieving mechanisms such as defect generation, islanding, and alloy formation at 730 degrees C. It was found that, instead of formation of InN layer, defective In-rich InGaN layer with thickness fluctuations was formed to relieve large lattice mismatch over 10% between InN and GaN. By introducing growth interruption (GI) before GaN capping at the same temperature, however, atomically flat InGaN/GaN interfaces were observed, and the quality of In-rich InGaN layer was greatly improved. We found that decomposition and mass transport processes during GI in InGaN layer are responsible for this phenomenon. There exists severe decomposition in InGaN layer during GI, and a 1-nm-thick InGaN layer remained after GI due to stronger bond strength near the InGaN/GaN interface. It was observed that the mass transport processes actively occurred during GI in InGaN layer above 730 degrees C so that defect annihilation in InGaN layer was greatly enhanced. Finally, based on these experimental results, we propose the growth mechanism of In-rich InGaN/GaN QWs using GI.open9

Strong carrier localization and diminished quantum-confined Stark effect in ultra-thin high-indium-content InGaN quantum wells with violet light emission

Here, we report on the optical and structural characteristics of violet-light-emitting, ultra-thin, high-Indium-content (UTHI) InGaN/GaN multiple quantum wells (MQWs), and of conventional low-In-content MQWs, which both emit at similar emission energies though having different well thicknesses and In compositions. The spatial inhomogeneity of In content, and the potential fluctuation in high-efficiency UTHI MQWs were compared to those in the conventional low-In-content MQWs. We conclude that the UTHI InGaN MQWs are a promising structure for achieving better quantum efficiency in the visible and near-ultraviolet spectral range, owing to their strong carrier localization and reduced quantum-confined Stark effect.open0

Observation of oxide precipitates in InN nanostructures

We observed the formation of oxide precipitates (bcc-In(2)O(3)) in InN nanostructures formed during metal-organic chemical vapor deposition (MOCVD) and/or subsequent postgrowth procedures in H(2) ambient. It was found that InN is extremely unstable in H(2) ambient and the activation energy of N(2) desorption of InN is measured to be similar to 0.28 eV, which is one order of magnitude smaller than that of reported value of InN in vacuum. Instability of InN nanostructures under H(2) ambient together with residual oxidant in the reactor facilitates the formation of indium oxide precipitates in the nanostructure matrix during MOCVD or the oxidation of residual indium at the surface, resulting in indium oxide dots.open3

Optical and microstructural studies of atomically flat ultrathin In-rich InGaN/GaN multiple quantum wells

Optical and microstructural properties of atomically flat ultrathin In-rich (UTIR) InGaN/GaN multiple quantum well were investigated by means of photoluminescence (PL), time-resolved PL (TRPL), and cathodoluminescence (CL) experiments. The sample exhibits efficient trapping of the photoexcited carriers into quantum wells (QWs) and the effect of internal electric field in the QWs was found negligible by excitation power-dependent PL and TRPL. These phenomena were attributed to the nature of UTIR InGaN QWs, indicating the potential of this system for application in optoelectronic devices. Variation of TRPL lifetime across the PL band and spatially resolved monochromatic CL mapping images strongly suggest that there is micrometer-scale inhomogeneity in effective band gap in UTIR InGaN/GaN QWs, which is originated from two types of localized areas.open141

Methane as an effective hydrogen source for single-layer graphene synthesis on Cu foil by plasma enhanced chemical vapor deposition

A single-layer graphene is synthesized on Cu foil in the absence of H2 flow by plasma enhanced chemical vapor deposition (PECVD). In lieu of an explicit H2 flow, hydrogen species are produced during methane decomposition process into their active species (CHx<4), assisted by the plasma. Notably, the early stage of growth depends strongly on the plasma power. The resulting grain size (the nucleation density) has a maximum (minimum) at 50 W and saturates when the plasma power is higher than 120 W because hydrogen partial pressures are effectively tuned by a simple control of the plasma power. Raman spectroscopy and transport measurements show that decomposed methane alone can provide sufficient amount of hydrogen species for high-quality graphene synthesis by PECVD.Comment: 22 pages, 6 figure