Effectively Transparent Front Contacts for Optoelectronic Devices

Effectively transparent front contacts for optoelectronic devices achieve a measured transparency of up to 99.9% and a measured sheet resistance of 4.8 Ω sq^(−1). The 3D microscale triangular cross-section grid fingers redirect incoming photons efficiently to the active semiconductor area and can replace standard grid fingers as well as transparent conductive oxide layers in optoelectronic devices

Enhanced Stability and Efficiency for Photoelectrochemical Iodide Oxidation by Methyl Termination and Electrochemical Pt Deposition of n-Si Microwire Arrays

Arrays of Si microwires doped n-type (n-Si) and surface-functionalized with methyl groups have been used, with or without deposition of Pt electrocatalysts, to photoelectrochemically oxidize I–(aq) to I_3–(aq) in 7.6 M HI(aq). Under conditions of iodide oxidation, methyl-terminated n-Si microwire arrays exhibited stable short-circuit photocurrents over a time scale of days, albeit with low energy-conversion efficiencies. In contrast, electrochemical deposition of Pt onto methyl-terminated n-Si microwire arrays consistently yielded energy-conversion efficiencies of ∼2% for iodide oxidation, with an open-circuit photovoltage of ∼400 mV and a short-circuit photocurrent density of ∼10 mA cm^(–2) under 100 mW cm^(–2) of simulated air mass 1.5G solar illumination. Platinized electrodes were stable for >200 h of continuous operation, with no discernible loss of Si or Pt. Pt deposited using electron-beam evaporation also resulted in stable photoanodic operation of the methyl-terminated n-Si microwire arrays but yielded substantially lower photovoltages than when Pt was deposited electrochemically

Enhanced Absorption and <1% Spectrum-and-Angle-Averaged Reflection in Tapered Microwire Arrays

We report ordered, high aspect ratio, tapered Si microwire arrays that exhibit an extremely low angular (0° to 50°) and spectrally averaged reflectivity of <1% of the incident 400–1100 nm illumination. After isolating the microwires from the substrate with a polymer infill and peel off process, the arrays were found to absorb 89.1% of angular averaged incident illumination (0° to 50°) in the equivalent volume of a 20 μm thick Si planar slab, reaching 99.5% of the classical light trapping limit between 400 and 1100 nm. We explain the broadband absorption by enhancement in coupling to waveguide modes due to the tapered microstructure of the arrays. Time-resolved microwave photoconductivity decay measurements yielded charge-carrier lifetimes of 0.75 μs (more than an order of magnitude higher than vapor–liquid–solid-grown Si microwires) in the tapered microwires, resulting in an implied V_(oc) of 0.655 V. The high absorption and high aspect ratio in these ordered microwire arrays make them an attractive platform for high-efficiency thin-film crystalline Si solar cells and as well as for the photoelectrochemical production of fuels from sunlight

Effectively Transparent Front Contacts for Optoelectronic Devices

Effectively transparent front contacts for optoelectronic devices achieve a measured transparency of up to 99.9% and a measured sheet resistance of 4.8 Ω sq^(−1). The 3D microscale triangular cross-section grid fingers redirect incoming photons efficiently to the active semiconductor area and can replace standard grid fingers as well as transparent conductive oxide layers in optoelectronic devices

Enhanced Stability and Efficiency for Photoelectrochemical Iodide Oxidation by Methyl Termination and Electrochemical Pt Deposition of n-Si Microwire Arrays

Arrays of Si microwires doped n-type (n-Si) and surface-functionalized with methyl groups have been used, with or without deposition of Pt electrocatalysts, to photoelectrochemically oxidize I–(aq) to I_3–(aq) in 7.6 M HI(aq). Under conditions of iodide oxidation, methyl-terminated n-Si microwire arrays exhibited stable short-circuit photocurrents over a time scale of days, albeit with low energy-conversion efficiencies. In contrast, electrochemical deposition of Pt onto methyl-terminated n-Si microwire arrays consistently yielded energy-conversion efficiencies of ∼2% for iodide oxidation, with an open-circuit photovoltage of ∼400 mV and a short-circuit photocurrent density of ∼10 mA cm^(–2) under 100 mW cm^(–2) of simulated air mass 1.5G solar illumination. Platinized electrodes were stable for >200 h of continuous operation, with no discernible loss of Si or Pt. Pt deposited using electron-beam evaporation also resulted in stable photoanodic operation of the methyl-terminated n-Si microwire arrays but yielded substantially lower photovoltages than when Pt was deposited electrochemically

Paths Towards High Efficiency Silicon Photovoltaics

While photovoltaics hold much promise as a sustainable electricity source, continued cost reduction is necessary to continue the current growth in deployment. A promising path to continuing to reduce total system cost is by increasing device efficiency. This thesis explores several silicon-based photovoltaic technologies with the potential to reach high power conversion efficiencies. Silicon microwire arrays, formed by joining millions of micron diameter wires together, were developed as a low cost, low efficiency solar technology. The feasibility of transitioning this to a high efficiency technology was explored. In order to achieve high efficiency, high quality silicon material must be used. Lifetimes and diffusion lengths in these wires were measured and the action of various surface passivation treatments studied. While long lifetimes were not achieved, strong inversion at the silicon / hydrofluoric acid interface was measured, which is important for understanding a common measurement used in solar materials characterization. Cryogenic deep reactive ion etching was then explored as a method for fabricating high quality wires and improved lifetimes were measured. As another way to reach high efficiency, growth of silicon-germanium alloy wires was explored as a substrate for a III-V on Si tandem device. Patterned arrays of wires with up to 12% germanium incorporation were grown. This alloy is more closely lattice matched to GaP than silicon and allows for improvements in III-V integration on silicon. Heterojunctions of silicon are another promising path towards achieving high efficiency devices. The GaP/Si heterointerface and properties of GaP grown on silicon were studied. Additionally, a substrate removal process was developed which allows the formation of high quality free standing GaP films and has wide applications in the field of optics. Finally, the effect of defects at the interface of the amorphous silicon heterojuction cell was studied. Excellent voltages, and thus efficiencies, are achievable with this system, but the voltage is very sensitive to growth conditions. We directly measured lateral transport lengths at the heterointerface on the order of tens to hundreds of microns, which allows carriers to travel towards any defects that are present and recombine. This measurement adds to the understanding of these types of high efficiency devices and may aid in future device design.</p

Highly absorbing and high lifetime tapered silicon microwire arrays as an alternative for thin film crystalline silicon solar cells

We report cryogenic inductively coupled plasma reactive ion etching (ICPRIE) etched tapered silicon microwires are ideal light trapping structures with extremely low (1.08% between 400 nm–1100 nm under normal incidence) reflectivity. We show that these tapered microwire arrays absorb 90.12% of incident light under normal incidence in an effectively 20 μm thick silicon when embedded in a polymer and peeled off the substrate, making them an attractive alternative for achieving high efficiency in thin film crystalline silicon solar cells. We show that microwave photoconductivity decay measurements as a simple quick way to measure carrier lifetimes in etched microwires under various liquid surface passivation techniques to estimate surface recombination velocities. The etched structures demonstrate >1 μs lifetimes

Highly absorbing and high lifetime tapered silicon microwire arrays as an alternative for thin film crystalline silicon solar cells

We report cryogenic inductively coupled plasma reactive ion etching (ICPRIE) etched tapered silicon microwires are ideal light trapping structures with extremely low (1.08% between 400 nm–1100 nm under normal incidence) reflectivity. We show that these tapered microwire arrays absorb 90.12% of incident light under normal incidence in an effectively 20 μm thick silicon when embedded in a polymer and peeled off the substrate, making them an attractive alternative for achieving high efficiency in thin film crystalline silicon solar cells. We show that microwave photoconductivity decay measurements as a simple quick way to measure carrier lifetimes in etched microwires under various liquid surface passivation techniques to estimate surface recombination velocities. The etched structures demonstrate >1 μs lifetimes

GaP/Si heterojunction solar cells

The world record efficiency and open circuit voltage for crystalline silicon solar cells are held by a-Si/Si heterojunction devices. While a-Si provides excellent surface passivation, these heterojunction devices are limited by non-ideal optical and electronic properties. Gallium phosphide is a candidate material for replacing a-Si in a heterojunction device, promising lower parasitic absorption and better carrier mobilities. In this work, we present our results in growing high quality GaP thin films directly on Si using a two-step nucleation and growth scheme with metalorganic chemical vapor deposition, characterization, and x-ray photoelectron spectroscopy band offset measurements toward realizing a GaP/Si heterojunction device