804 research outputs found

    Mechanism for zirconium oxide atomic layer deposition using bis(methylcyclopentadienyl)methoxymethyl zirconium

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    The mechanism for zirconium oxide atomic layer deposition using bis(methylcyclopentadienyl)methoxymethyl zirconium and H(2)O was examined using ab initio calculations of hydrolysis energies to predict the order of ligand loss. These predictions were tested using in situ mass spectrometric measurements which revealed that the methyl ligand, and 65% of the methylcyclopentadienyl ligands are lost during the zirconium precursor adsorption. The remaining 35% of the methylcyclopentadienyl ligands and the methoxy ligand are lost during the subsequent H(2)O exposure. These measurements agree very well with the predictions, demonstrating that thermodynamic calculations are a simple and accurate predictor for the reactivities of these compounds. (c) 2007 American Institute of Physics. (DOI: 10.1063/1.2824814

    Secondary electron yield of emissive materials for large-area micro-channel plate detectors: surface composition and film thickness dependencies

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    The ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexpensive and robust borosilicate micro-channel substrates for use as Micro-Channel Plates (MCPs). The surfaces of the channels in these glass plates are functionalized to control the conductivity as well as the Secondary Electron Yield (SEY). The extensive SEY data found in literature show significant variation for a given material depending on the apparatus, the measurement procedure, and the sample preparation and handling. We present systematic studies on the effects of film thickness and surface chemical composition on SEY. We have modified an existing ultra-high vacuum apparatus containing X-ray and Ultraviolet Photoelectron Spectrometers (XPS and UPS, respectively) by adding a modified Low Energy Electron Diffraction (LEED) module for SEY measurements. With these tools, we have characterized the secondary electron emissive properties for MgO, Al2O3, and multilayered MgO/TiO2 structures to serve as electron emissive layers in the channels of the MCPs

    Deconvolving Instrumental and Intrinsic Broadening in Excited State X-ray Spectroscopies

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    Intrinsic and experimental mechanisms frequently lead to broadening of spectral features in excited-state spectroscopies. For example, intrinsic broadening occurs in x-ray absorption spectroscopy (XAS) measurements of heavy elements where the core-hole lifetime is very short. On the other hand, nonresonant x-ray Raman scattering (XRS) and other energy loss measurements are more limited by instrumental resolution. Here, we demonstrate that the Richardson-Lucy (RL) iterative algorithm provides a robust method for deconvolving instrumental and intrinsic resolutions from typical XAS and XRS data. For the K-edge XAS of Ag, we find nearly complete removal of ~9.3 eV FWHM broadening from the combined effects of the short core-hole lifetime and instrumental resolution. We are also able to remove nearly all instrumental broadening in an XRS measurement of diamond, with the resulting improved spectrum comparing favorably with prior soft x-ray XAS measurements. We present a practical methodology for implementing the RL algorithm to these problems, emphasizing the importance of testing for stability of the deconvolution process against noise amplification, perturbations in the initial spectra, and uncertainties in the core-hole lifetime.Comment: 35 pages, 13 figure

    Ultrathin Oxide Films by Atomic Layer Deposition on Graphene

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    In this paper, a method is presented to create and characterize mechanically robust, free standing, ultrathin, oxide films with controlled, nanometer-scale thickness using Atomic Layer Deposition (ALD) on graphene. Aluminum oxide films were deposited onto suspended graphene membranes using ALD. Subsequent etching of the graphene left pure aluminum oxide films only a few atoms in thickness. A pressurized blister test was used to determine that these ultrathin films have a Young's modulus of 154 \pm 13 GPa. This Young's modulus is comparable to much thicker alumina ALD films. This behavior indicates that these ultrathin two-dimensional films have excellent mechanical integrity. The films are also impermeable to standard gases suggesting they are pinhole-free. These continuous ultrathin films are expected to enable new applications in fields such as thin film coatings, membranes and flexible electronics.Comment: Nano Letters (just accepted
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