54 research outputs found
Ultra-high accuracy optical testing: creating diffraction-limitedshort-wavelength optical systems
Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conducted at Lawrence Berkeley National Laboratory (LBNL) and Lawrence Livermore National Laboratory (LLNL), has produced the highest resolution optical systems ever made. We have pioneered the development of ultra-high-accuracy optical testing and alignment methods, working at extreme ultraviolet wavelengths, and pushing wavefront-measuring interferometry into the 2-20-nm wavelength range (60-600 eV). These coherent measurement techniques, including lateral shearing interferometry and phase-shifting point-diffraction interferometry (PS/PDI) have achieved RMS wavefront measurement accuracies of 0.5-1-{angstrom} and better for primary aberration terms, enabling the creation of diffraction-limited EUV optics. The measurement accuracy is established using careful null-testing procedures, and has been verified repeatedly through high-resolution imaging. We believe these methods are broadly applicable to the advancement of short-wavelength optical systems including space telescopes, microscope objectives, projection lenses, synchrotron beamline optics, diffractive and holographic optics, and more. Measurements have been performed on a tunable undulator beamline at LBNL's Advanced Light Source (ALS), optimized for high coherent flux; although many of these techniques should be adaptable to alternative ultraviolet, EUV, and soft x-ray light sources. To date, we have measured nine prototype all-reflective EUV optical systems with NA values between 0.08 and 0.30 (f/6.25 to f/1.67). These projection-imaging lenses were created for the semiconductor industry's advanced research in EUV photolithography, a technology slated for introduction in 2009-13. This paper reviews the methods used and our program's accomplishments to date
Complement system activation contributes to the ependymal damage induced by microbial neuraminidase
Background
In the rat brain, a single intracerebroventricular injection of neuraminidase from Clostridium perfringens induces ependymal detachment and death. This injury occurs before the infiltration of inflammatory blood cells; some reports implicate the complement system as a cause of these injuries. Here, we set out to test the role of complement.
Methods
The assembly of the complement membrane attack complex on the ependymal epithelium of rats injected with neuraminidase was analyzed by immunohistochemistry. Complement activation, triggered by neuraminidase, and the participation of different activation pathways were analyzed by Western blot. In vitro studies used primary cultures of ependymal cells and explants of the septal ventricular wall. In these models, ependymal cells were exposed to neuraminidase in the presence or absence of complement, and their viability was assessed by observing beating of cilia or by trypan blue staining. The role of complement in ependymal damage induced by neuraminidase was analyzed in vivo in two rat models of complement blockade: systemic inhibition of C5 by using a function blocking antibody and testing in C6-deficient rats.
Results
The complement membrane attack complex immunolocalized on the ependymal surface in rats injected intracerebroventricularly with neuraminidase. C3 activation fragments were found in serum and cerebrospinal fluid of rats treated with neuraminidase, suggesting that neuraminidase itself activates complement. In ventricular wall explants and isolated ependymal cells, treatment with neuraminidase alone induced ependymal cell death; however, the addition of complement caused increased cell death and disorganization of the ependymal epithelium. In rats treated with anti-C5 and in C6-deficient rats, intracerebroventricular injection of neuraminidase provoked reduced ependymal alterations compared to non-treated or control rats. Immunohistochemistry confirmed the absence of membrane attack complex on the ependymal surfaces of neuraminidase-exposed rats treated with anti-C5 or deficient in C6.
Conclusions
These results demonstrate that the complement system contributes to ependymal damage and death caused by neuraminidase. However, neuraminidase alone can induce moderate ependymal damage without the aid of complement
Initial Calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO)
Coherence effects from visible light to X-rays
The development of the concept of coherence of light and its application for experiments in the XUV range are reviewed . Coherence was originally defined by the visibility of interference fringes, and the main effort of early work was to produce coherency from non-coherent, chaotic or thermal sources. With the invention of the laser, fully coherent light became available, leading to further clarification of the coherence concept. The laser offered the first possibility to observe easily interference effects between different, independent light sources. By providing many photons in a single mode, non-linear effects, such as the generation of higher harmonics or sum and difference frequencies became possible . The generation of non-classical fields, i.e . fields which are only allowed by quantum theory but have no analogue m classical physics, is a more recent development. Synchrotron sources in the XUV region are now reaching the brightness which visible light had at the beginning of the sixties and the first soft X-ray lasers are available. Brightness is now sufficient to prepare spatially coherent X-ray beam with sufficient intensity for holography or the observation of coherency effects in the fluctuations of the light intensity. Non-linear effects might become observable by mixing synchrotron radiation with laser light
Soft X-Ray Optics.
This text describes optics mainly in the 10 to 500 angstrom wavelength region. These wavelengths are 50 to 100 times shorter than those for visible light and 50 to 100 times longer than the wavelengths of medical x rays or x-ray diffraction from natural crystals. There have been substantial advances during the last 20 years, which one can see as an extension of optical technology to shorter wavelengths or as an extension of x-ray diffraction to longer wavelengths. Artificial diffracting structures like zone plates and multilayer mirrors are replacing the natural crystals of x-ray diffraction
Heavy ion microlithography â a new tool to generate and investigate submicroscopic structures
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