N-Fluoro-N-Perfluoromethyl sulfonamides

N-fluoro-N-perfluoromethyl sulfonamide compounds are provided as fluorinating agents for the fluorination of organic compounds by either the direct electrophilic fluorination of organic compounds or by the fluorination of organic compound carbanions

N-fluoro-N-perfluoromethyl sulfonamides

N-fluoro-N-perfluoromethyl sulfonamide compounds are provided as fluorinating agents for the fluorination of organic compounds by either the direct electrophilic fluorination of organic compounds or by the fluorination of organic compound carbanions

Ternary refrigerant compositions which contain perfluoroorgano sulfur compounds as replacements for R-22

Refrigerant compositions include mixtures of at least three different components, including a fluorinated sulfur-containing compound with at least one of a fluorinated ether or a fluorinated hydrocarbon. Also, methods for cooling a body include compressing such a refrigerant composition and bringing the body into heat transfer relation to it. The disclosed refrigerant compounds have refrigerant-significant properties similar to those of R-22, and they can be employed as drop-in substitutes in refrigeration apparatus designed for R-22 application

Ternary refrigerant compositions containing fluorinated ethers as replacements for R-22

Refrigerant compositions include mixtures of at least three different components, including a fluorinated ether with at least one of a second fluorinated ether, an ether and a fluorinated hydrocarbon. Also, methods for cooling a body include compressing such a refrigerant composition and bringing the body into heat transfer relation to it. The disclosed refrigerant compounds have refrigerant-significant properties similar to those of R-22, and they can be employed in place of or as drop-in substitutes in refrigeration apparatus designed for R-22 application

LITHIUM SALTS OF FLUORINATED BORATE ESTERS FOR LITHIUM-ION BATTERIES

Lithium salts with fluorinated chelated orthoborate anions are prepared and used as electrolytes or electrolyte additives in lithium-ion batteries. The lithium salts have two chelate rings formed by the coordination of two bidentate ligands to a single boron atom. In addition, each chelate ring has two oxygen atoms bonded to one boron atom, methylene groups bonded to the two oxygen atoms, and one or more fluorinated carbon atoms bonded to and forming a cyclic bridge between the methylene groups

Resist materials for 157-nm microlithography: an update

Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidates for 157 nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157 nm resist materials based on the first of these two polymer systems. In addition to the 2-hydroxyhexafluoropropyl group, (alpha) -trifluoromethyl carboxylic acids have been identified as surprisingly transparent acidic functional groups. Polymers based on these groups have been prepared and preliminary imaging studies at 157 nm are described. 2-Trifluoromethyl-bicyclo[2,2,1] heptane-2-carboxylic acid methyl ester derived from methyl 2-(trifluoromethyl)acrylate was also prepared and gas-phase VUV measurements showed substantially improved transparency over norbornane. This appears to be a general characteristic of norbornane-bearing geminal electron-withdrawing substituents on the 2 carbon bridge. Unfortunately, neither the NiII nor PdII catalysts polymerize these transparent norbornene monomers by vinyl addition. However, several new approaches to incorporating these transparent monomers into functional polymers have been investigated. The first involved the synthesis of tricyclononene (TCN) monomers that move the bulky electron withdrawing groups further away from the site of addition. The hydrogenated geminally substituted TCN monomer still has far better transparency at 157 nm than norbornane. The second approach involved copolymerizing the norbornene monomers with carbon monoxide. The third approach involved free-radical polymerization of norbornene monomers with tetrafluoroethylene and/or other electron-deficient comonomers. All these approaches provided new materials with encouraging absorbance at 157 nm. The lithographic performance of some of these polymers is discussed

Resist materials for 157-nm microlithography: an update

Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidates for 157 nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157 nm resist materials based on the first of these two polymer systems. In addition to the 2-hydroxyhexafluoropropyl group, (alpha) -trifluoromethyl carboxylic acids have been identified as surprisingly transparent acidic functional groups. Polymers based on these groups have been prepared and preliminary imaging studies at 157 nm are described. 2-Trifluoromethyl-bicyclo[2,2,1] heptane-2-carboxylic acid methyl ester derived from methyl 2-(trifluoromethyl)acrylate was also prepared and gas-phase VUV measurements showed substantially improved transparency over norbornane. This appears to be a general characteristic of norbornane-bearing geminal electron-withdrawing substituents on the 2 carbon bridge. Unfortunately, neither the NiII nor PdII catalysts polymerize these transparent norbornene monomers by vinyl addition. However, several new approaches to incorporating these transparent monomers into functional polymers have been investigated. The first involved the synthesis of tricyclononene (TCN) monomers that move the bulky electron withdrawing groups further away from the site of addition. The hydrogenated geminally substituted TCN monomer still has far better transparency at 157 nm than norbornane. The second approach involved copolymerizing the norbornene monomers with carbon monoxide. The third approach involved free-radical polymerization of norbornene monomers with tetrafluoroethylene and/or other electron-deficient comonomers. All these approaches provided new materials with encouraging absorbance at 157 nm. The lithographic performance of some of these polymers is discussed