Nanoscale local modification of PMMA refractive index by tip-enhanced femtosecond pulsed laser irradiation

Investigation techniques based on tip-enhanced optical effects, capable to yield spatial resolutions down to nanometers level, have enabled a wide palette of important discoveries over the past twenty years. Recently, their underlying optical setups are beginning to emerge as useful tools to modify and manipulate matter with nanoscale spatial resolution. We try to contribute to these efforts by reporting a method that we found viable to modify the surface refractive index of polymethyl methacrylate (PMMA), an acrylic polymer material. The changes in the refractive index are accomplished by focusing a femtosecond pulsed near-infrared laser beam on the apex of a metalized nano-sized tip, traditionally used in scanning probe microscopy (SPM) applications. The adopted illumination strategy yields circular-shaped modifications of the refractive index occurring at the surface of the PMMA sample, exhibiting a lateral size <200 nm, under 790 nm illumination, representing a four-fold increase in precision compared to the current state-of-the-art. The light intensity enhancement effects taking place at the tip apex makes possible achieving refractive index changes at low laser pulse energies (<0.5 nJ), which represents two orders of magnitude advantage over the current state-of-the art. The presented nanoimprinting method is very flexible, as it can be used with different power levels and can potentially be operated with other materials. Besides enabling modifications of the refractive index with high lateral resolution, this method can pave the way towards other important applications such the fabrication of photonic crystal lattices or surface waveguides

Mapping electron beam injected trapped charge with scattering scanning near-field optical microscopy

Scattering scanning near-field optical microscopy (s-SNOM) has been demonstrated as a valuable tool for mapping the optical and optoelectronic properties of materials with nanoscale resolution. Here we report experimental evidence that trapped electric charges injected by an electron beam at the surface of dielectric samples affect the sample-dipole interaction, which has direct impact on the s-SNOM image content. Nanoscale mapping of the surface trapped charge holds significant potential for the precise tailoring of the electrostatic properties of dielectric and semiconductive samples, such as hydroxyapatite, which has particular importance with respect to biomedical applications. The methodology developed here is highly relevant to semiconductor device fabrication as well

Combined far-field, near-field and topographic imaging of nano-engineered polyelectrolyte capsules

Nano-engineered polyelectrolyte capsules (NPCs) were investigated using a multimodal approach based on Confocal Laser Scanning Microscopy, scattering-type Scanning Near-Field Optical Microscopy and Atomic Force Microscopy. Our experiment demonstrates that correlating optical information collected with far-field and near-field techniques to topographic data holds significant potential for gaining new insights on the structure of NPCs assembled with layer-by-layer strategies

Generic arrays of surface-positioned and shallow-buried gold multi-shapes as reference samples to benchmark near-field microscopes. Part 1: Applications in s-SNOM depth imaging

A wide palette of nanoscale imaging techniques operating in the near-field regime has been reported to date, enabling an important number of scientific breakthroughs. While the tuning and benchmarking of near-field microscopes represent a very important step for optimizing the outputs of the imaging sessions, no generally acknowledged standards exist yet in terms of calibration of near-field microscopes, which would play an important role in fully exploiting the potential of these instruments. With this work, we aim to contribute to filling in this gap, by introducing a prototypical sample, that holds potential for becoming a benchmark with respect to comparing the performances of diverse near-field measurement techniques, including traditional, aperture based, scanning near field microscopy (SNOM), or apertureless variants, such as scattering-type scanning nearfield optical microscopy (s-SNOM). The proposed samples have been thoroughly simulated, and an easy fabrication procedure is presented and demonstrated. In this latter context, Au-SiO2 samples sharing different configurations, in terms of geometry, number and depth of contrast yielding layers, enabling both surface and sub-surface nanoscopy measurements, were designed and fabricated. We argue that the proposed prototypical samples can be highly useful for benchmarking the outputs of various near-field microscopy techniques, as they facilitate a broad range of tests, relevant for comparing the performances and accuracy of many diverse investigation methods. We also introduce a methodology for numerically simulating the samples and their near-field after illuminating them with light of different wavelengths, as well as their simple process flow. This methodology can considerably augment their future use as a prototypical sample for the evaluation and calibration of current and next generation near-field nanoscopy techniques. Experimental evidence on the usefulness of these samples as s-SNOM testing and benchmarking tools is provided in the context of differentiation of surface and sub-surface structures, and influence of tip-sample distance on attainable amplitude and phase signals. We consider these efforts to represent an important, required step, in advancing the near-field imaging field, with important potential to augment the outputs of current near-field imaging systems, and to facilitate the development and benchmarking of next generation of near-field instrumentation

SSNOMBACTER: A collection of scattering-type scanning near-field optical microscopy and atomic force microscopy images of bacterial cells

In recent years, a variety of imaging techniques operating at nanoscale resolution have been reported. These techniques have the potential to enrich our understanding of bacterial species relevant to human health, such as antibiotic-resistant pathogens. However, owing to the novelty of these techniques, their use is still confined to addressing very particular applications, and their availability is limited owing to associated costs and required expertise. Among these, scattering-type scanning near field optical microscopy (s-SNOM) has been demonstrated as a powerful tool for exploring important optical properties at nanoscale resolution, depending only on the size of a sharp tip. Despite its huge potential to resolve aspects that cannot be tackled otherwise, the penetration of s-SNOM into the life sciences is still proceeding at a slow pace for the aforementioned reasons

Structural and mechanical properties of CrN thin films deposited on Si substrate by using magnetron techniques

Chromium Nitride thin films are known for their good mechanical properties. We present the characteristics of ultrathin Chromium Nitride films under 400 nm thickness deposited on silicon substrates by direct current and high-power impulse magnetron sputtering techniques. The methods of investigation of the CrN films were scanning electron microscopy, atomic force microscopy, and nanoindentation. Qualitative and quantitative analysis were performed using the AFM and SEM images by fractal dimension, surface roughness and gray-level co-occurrence matrix methods. Our results show that using the mag-netron techniques, ultrathin CrN films with excellent mechanical properties can be obtained

Structural and Mechanical Properties of CrN Thin Films Deposited on Si Substrate by Using Magnetron Techniques

Chromium nitride thin films are known for their good mechanical properties. We present the characteristics of ultrathin chromium nitride films under 400 nm thickness deposited on silicon substrates by direct current and high-power impulse magnetron sputtering techniques. The methods of investigation of the CrN films were scanning electron microscopy, atomic force microscopy, and nanoindentation. Qualitative and quantitative analyses were performed using AFM and SEM images by fractal dimension, surface roughness and gray-level co-occurrence matrix methods. Our results show that using magnetron techniques, ultrathin CrN films with excellent mechanical properties were obtained, characterized by values of Young&rsquo;s modulus between 140 GPa and 250 GPa for the samples obtained using high-power impulse magneton sputtering (HiPIMS) and between 240 GPa and 370 GPa for the samples obtained using direct current sputtering (DC). Stiffness measurements also reveal the excellent mechanical properties of the investigated samples, where the samples obtained using HiPIMS sputtering had stiffness values between 125 N/m and 132 N/m and the samples obtained using DC sputtering had stiffness values between 110 N/m and 119 N/m

Structural and Mechanical Properties of CrN Thin Films Deposited on Si Substrate by Using Magnetron Techniques

Chromium nitride thin films are known for their good mechanical properties. We present the characteristics of ultrathin chromium nitride films under 400 nm thickness deposited on silicon substrates by direct current and high-power impulse magnetron sputtering techniques. The methods of investigation of the CrN films were scanning electron microscopy, atomic force microscopy, and nanoindentation. Qualitative and quantitative analyses were performed using AFM and SEM images by fractal dimension, surface roughness and gray-level co-occurrence matrix methods. Our results show that using magnetron techniques, ultrathin CrN films with excellent mechanical properties were obtained, characterized by values of Young’s modulus between 140 GPa and 250 GPa for the samples obtained using high-power impulse magneton sputtering (HiPIMS) and between 240 GPa and 370 GPa for the samples obtained using direct current sputtering (DC). Stiffness measurements also reveal the excellent mechanical properties of the investigated samples, where the samples obtained using HiPIMS sputtering had stiffness values between 125 N/m and 132 N/m and the samples obtained using DC sputtering had stiffness values between 110 N/m and 119 N/m