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Molecular beam epitaxy of InN dots on nitrided sapphire
A series of self-assembled InN dots are grown by radio frequency (RF) plasma-assisted molecular beam epitaxy (MBE) directly on nitrided sapphire. Initial nitridation of the sapphire substrates at 900 C results in the formation of a rough AlN surface layer, which acts as a very thin buffer layer and facilitates the nucleation of the InN dots according to the Stranski-Krastanow growth mode, with a wetting layer of {approx}0.9 nm. Atomic force microscopy (AFM) reveals that well-confined InN nanoislands with the greatest height/width at half-height ratio of 0.64 can be grown at 460 C. Lower substrate temperatures result in a reduced aspect ratio due to a lower diffusion rate of the In adatoms, whereas the thermal decomposition of InN truncates the growth at T>500 C. The densities of separated dots vary between 1.0 x 10{sup 10} cm{sup -2} and 2.5 x 10{sup 10} cm{sup -2} depending on the growth time. Optical response of the InN dots under laser excitation is studied with apertureless near-field scanning optical microscopy and photoluminescence spectroscopy, although no photoluminescence is observed from these samples. In view of the desirable implementation of InN nanostructures into photonic devices, the results indicate that nitrided sapphire is a suitable substrate for growing self-assembled InN nanodots
Herstellung künstlicher Atome mit magnetischen Eigenschaften
This thesis presents the detailed development of the fabrication process and the first observations of artificial magnetic atoms from the II-VI diluted magnetic semiconductor alloy (Zn,Cd,Be,Mn)Se. In order to manufacture the vertical quantum dot device which exhibits artificial atom behavior a number of development steps are conducted. First, the II-VI heterostructure is adjusted for the linear transport regime. Second, state of the art vertical quantum dot fabrication techniques in the III-V material system are investigated regarding their portability to the II-VI heterostructure. And third, new approaches to the fabrication process are developed, taking into account the complexity of the heterostructure and its physical properties. Finally a multi-step fabrication process is presented, which is built up from electron beam and optical lithography, dry and wet etching and insulator deposition. This process allows for the processing of pillars with diameters down to 200 nm with an insulating dielectric and gate. Preliminary transport data on the fabricated vertical quantum dots are presendted confirming the magnetic nature of the resulting artificial atoms.Die Fabrikation und Erforschung künstlicher Atome ist hinsichtlich ihres physikalischen Verständnisses und ihrer Herstellungstechnologie weit fortgeschritten.
Diese werden vorwiegend in lateralen oder vertikalen Quantenpunkten (QDots) aus dem III-V Materialsystem erzeugt.
Allerdings ist es derzeit nicht möglich, künstliche Atome mit ausgeprägten magnetischen Eigenschaften herzustellen, um diese zu untersuchen.
Diese Arbeit präsentiert die Punkt-für-Punkt-Entwicklung der Herstellungstechnologie sowie erste experimentelle Beobachtungen von künstlichen magnetischen Atomen aus dem II-VI verdünnt magnetischen Halbleitermaterialsystem (Zn,Cd,Be,Mn)Se.
Das der Entwicklung zugrunde liegende elektronische Bauelement ist eine resonante Tunneldiode (RTD) aus dem II-VI Halbleitermaterialsystem, die früher bereits entwickelt wurde. ..