8 research outputs found
Influência dos parâmetros de processo na deposição de nitreto de titânio por plasma em gaiola catódica
Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition
technique in order to verify the influence of process parameters in optical and structural
properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2,
setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied
from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission
Spectroscopy (OES) to investigate the influence of the active species in plasma. It was
observed that increasing the H2 gas flow into the plasma the luminescent intensities
associated to the species changed. In this case, the luminescence of N2 (391,4nm)
species was not proportional to the increasing of the H2 gas into the reactor. Other
parameters investigated were diameter and number of holes in the cage. The analysis
by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are
composed by TiN and they may have variations in the nitrogen amount into the crystal
and in the crystallite size. The optical microscopy images provided information about the
homogeneity of the films. The atomic force microscopy (AFM) results revealed some
microstructural characteristics and surface roughness. The thickness was measured by
ellipsometry. The optical properties such as transmittance and reflectance (they were
measured by spectrophotometry) are very sensitive to changes in the crystal lattice of
the material, chemical composition and film thicknesses. Therefore, such properties are
appropriate tools for verification of this process control. In general, films obtained at 0
sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller
crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained
at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed
peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half
Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the
films more stoichiometric and becomes it more crystalline. It was observed that with
higher number of holes in the lid of the cage, close to the region between the lid and the
sample and the smaller diameter of the hole, the deposited film is thicker, which is
justified by the most probability of plasma species reach effectively the sample and it
promotes the growth of the filmCoordenação de Aperfeiçoamento de Pessoal de Nível SuperiorFilmes finos de nitreto de titânio foram crescidos sobre vidro utilizando a técnica de
deposição por descarga em gaiola catódica a fim de averiguar a influência das variáveis
de processo nas propriedades ópticas e estruturais do filme. Como atmosfera do
plasma foi utilizada a mistura de gases Ar, N2 e H2, fixando o fluxo de Ar e N2 em 4 e 3
sccm, respectivamente, e usando fluxos de 0, 1 e 2 sccm de H2. O processo de
deposição foi monitorado por Espectroscopia de Emissão Óptica (OES) para
investigação das espécies ativas no plasma. Observou-se que com o aumento fluxo de
H2 as intensidades das espécies luminescentes no plasma sofrem alterações e que a
espécie N2 (391,4 nm) não teve um crescimento proporcional ao fluxo de H2. Outros
parâmetros investigados foram o diâmetro e o número de furos da gaiola. As análises
de difração de raios X com ângulo de incidência rasante (GIXRD) comprovaram que os
filmes obtidos são compostos por TiN, podendo ter variações quanto a quantidade de
nitrogênio na rede e o tamanho de cristalito; a microscopia óptica forneceu dados sobre
a homogeneidade, a partir da microscopia de força atômica (AFM) observou-se
algumas características microestruturais do filme e a rugosidade. A espessura foi
quantificada através das análises de elipsometria. As propriedades ópticas como
refletância e transmitância (medidas por espectrofotometria) são bastante sensíveis a
alterações na rede cristalina do material, composição química e espessura, sendo,
portanto, uma boa ferramenta para verificação do controle do processo. De maneira
geral, os filmes obtidos com fluxo de 0 sccm de H2 possuem uma maior transmitância
atribuída ao menor cristalinidade decorrente da maior quantidade de nitrogênio na rede
cristalina do TiN. Os filmes obtidos nos fluxos de 1 e 2 sccm de H2 obtiveram um
aspecto dourado e o difratograma apresentou picos característicos do TiN com maior
intensidade e menor largura a meia altura, sugerindo que com a presença de hidrogênio
na atmosfera do plasma os filmes são mais estequiométricos e com maior
cristalinidade. Quanto à configuração da gaiola observou-se que com maior quantidade
de furos na tampa, maior a proximidade da tampa com a amostra e menor o diâmetro
do furo, maior é a espessura do filme, o que é justificado pela maior probabilidade das
espécies do plasma atingirem efetivamente o substrato e promoverem o crescimento do
film
Porous Transport Layers Made of Niobium/Steel Composites for Water Electrolysis
In future energy concepts, water splitting by polymer electrolyte membrane (PEM) electrolysis is a key technology for converting regenerative energy from wind or sun into hydrogen. In this study, a novel porous transport layer for PEM electrolysis units was developed, which is based on a stainless steel substrate coated with a porous Nb layer. Nb layer is expected to improve the electrochemical performance and lifetime of electrolysis cells due to formation of a stable passivation layer with good electrical conductivity. Scalable powder metallurgical techniques like tape casting, screen printing and field assisted sintering/spark plasma sintering FAST/SPS were used for manufacturing this composite structure. The porous transport layer was characterized with respect to microstructure. FAST/SPS was found to be promising to decrease interdiffusion at the interface. Finally, first electrochemical tests were conducted on laboratory scale demonstrating the potential of the composite to replace state-of-the-art titanium-based transport layers
Manufacturing of highly porous titanium by metal injection molding in combination with plasma treatment
Highly-porous titanium was produced by metal injection molding (MIM) of feedstock containing potassium chloride particles as a space holder. Macroporosity was generated by dissolving the potassium chloride particles in water. Challenges for MIM of highly-porous parts include shape retention during debinding and sintering and achieving open surface porosity. This study demonstrates that plasma treatment can remedy both these effects for highly-porous titanium. Plasma treatment of unsintered MIM samples enables attaining porosities of up to 64% in combination with good dimensional accuracy. The effect of plasma treatment on the uptake of interstitial impurities, dimensional accuracy, sintered microstructure and porosity, as well as the interaction of the plasma with partially-debinded MIM samples, was investigated. Highly-porous titanium produced by MIM and plasma treatment is attractive for biomedical implants due to its low impurity content, good dimensional accuracy and shape stability in combination with enhanced open porosity, the latter contributing to bone ingrowth and implant fixation