Development and testing of an active platen for IC manufacturing

The conflicting demands for finer features and increased production rates in integrated circuit manufacturing have emphasized the need for improved wafer positioning technology. In this paper we present operational test results from a magnetically levitated platen with structurally integrated piezoelectric acctuators. The strain based actuators provide active damping of the platen`s flexible body modes, enabling increased bandwidth on the mag-lev positioning system. Test results reveal a dramatic reduction in steady state positioning error and settling time through implementation of active vibration control

Preliminary Performance Data on Westinghouse Electronic Power Regulator Operating on J34-WE-32 Turbojet Engine in Altitude Wind Tunnel

The behavior of the Westinghouse electronic power regulator operating on a J34-WE-32 turbojet engine was investigated in the NACA Lewis altitude wind tunnel at the request of the Bureau of Aeronautics, Department of the Navy. The object of the program was to determine the, steady-state stability and transient characteristics of the engine under control at various altitudes and ram pressure ratios, without afterburning. Recordings of the response of the following parameters to step changes in power lever position throughout the available operating range of the engine were obtained; ram pressure ratio, compressor-discharge pressure, exhaust-nozzle area, engine speed, turbine-outlet temperature, fuel-valve position, jet thrust, air flow, turbine-discharge pressure, fuel flow, throttle position, and boost-pump pressure. Representative preliminary data showing the actual time response of these variables are presented. These data are presented in the form of reproductions of oscillographic traces

NACA Research Memorandums

"The behavior of the Westinghouse electronic power regulator operating on a J34-WE-32 turbojet engine was investigated in the NACA Lewis altitude wind tunnel at the request of the Bureau of Aeronautics, Department of the Navy. The object of the program was to determine the, steady-state stability and transient characteristics of the engine under control at various altitudes and ram pressure ratios, without afterburning. Recordings of the response of the following parameters to step changes in power lever position throughout the available operating range of the engine were obtained; ram pressure ratio, compressor-discharge pressure, exhaust-nozzle area, engine speed, turbine-outlet temperature, fuel-valve position, jet thrust, air flow, turbine-discharge pressure, fuel flow, throttle position, and boost-pump pressure" (p. 1)

Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

This paper is an overview of the wafer and reticle positioning system of the Extreme Ultraviolet Lithography (EUVL) Engineering Test Stand (ETS). EUVL represents one of the most promising technologies for supporting the integrated circuit (IC) industry's lithography needs for critical features below 100nm. EUVL research and development includes development of capabilities for demonstrating key EUV technologies. The ETS is under development at the EUV Virtual National Laboratory, to demonstrate EUV full-field imaging and provide data that supports production-tool development. The stages and their associated metrology operated in a vacuum environment and must meet stringent outgassing specifications. A tight tolerance is placed on the stage tracking performance to minimize image distortion and provide high position repeatability. The wafer must track the reticle with less than {+-}3nm of position error and jitter must not exceed 10nm rms. To meet these performance requirements, magnetically levitated positioning stages utilizing a system of sophisticated control electronics will be used. System modeling and experimentation have contributed to the development of the positioning system and results indicate that desired ETS performance is achievable