Novel design for an ultra high precision 3D micro probe for CMM applications

AbstractThe paper reports on the design and testing of several new piezoresistive ultra high precision 3D microprobes for the use in coordinate measuring machines (CMM). The microprobes are all composed of three primary components a piezoresitive sensing element and stylus with probing sphere. The sensing element consists of a bossed KOH-etched silicon membrane with diffused piezoresistors. Several designs were investigated to increase sensor sensitivity while improving the anisotropy of stiffness. The initial design used a Wheatstone bridge piezoresistor configuration with a solid sensing membrane. Additionally, apertures where added to the solid silicon membrane to increase stress within the piezoresistors which untimely led to higher probe tip sensitivity. To improve the stiffness in the xy direction of the probe tip a double triangle design was tested that bonded two sensor chips back to back. This was found reduce the ratio between the stiffness in xy- and z-direction from 32 initially to 2

Final report on EUROMET.L-S15.a (EUROMET Project 925): Intercomparison on step height standards and 1D gratings

SUPPLEMENTARY COMPARISON Measurements have been made at five national metrology institutes (NMIs) in the subject field of dimensional measurement using scanning probe microscopy. Four of the participating NMIs are in Europe, the fifth is in the Asia-Pacific region. Each NMI made measurements of four step height standards and two 1D grating standards. These are typical artefact standards used for dimensional nanometrology. Each participant used a different atomic force microscope to perform the measurements. The report lists the results obtained by the individual participants, as well as an analysis of the results and their uncertainties, based on calculation of the weighted means and En values. The results are in good agreement with one another

European Nanometrology 2020

The Co-Nanomet project carried out a two year review of nanometrology status, opportunities and challenges across Europe. A set of goals and objectives have been established for European Nanometrology for the next decade (Vision 2020). The Co-Nanomet partners hope this document may act as a guide to the many bodies across Europe in their activities or responsibilities in the field of nanotechnology and related measurement requirements, as it moves into its next exciting decade.JRC.D.2-Reference material

Introductory Guide to Nanometrology

This Guide introduces the reader to the science of measurements at the nanoscale, that is nanometrology. It is aimed at researchers in the nanotechnology area, for whom the metrology aspect is new, and at metrologists, interested in knowing about the specifics of metrology at the nanoscale. The Guide does not give an exhaustive review of the field. Rather it is intended to increase the general awareness of nanometrology, and its basic challenges. In a first section, three main questions are addressed: 1. What is (nano)metrology? 2. Why is nanometrology important? 3. What are the main challenges for nanometrology? The Guide continues with a section on the meaning of a number of generic metrology concepts. In the third section, the Guide illustrates some of the identified nanometrological challenges with practical examples and case studies from three different application areas (thin films, surface structures and nanoparticles). A final subsection is devoted to the emerging issue of metrology for nanobiotechnologyJRC.DG.D.2-Reference material

Critical review of the current status of thickness measurements for ultrathin SiO on Si Part V: Results of a CCQM pilot study

A study was carried out for the measurement of ultrathin SiO on (100) and (111) orientation silicon wafer in the thickness range 1.5-8 nm. XPS, medium-energy ion scattering spectrometry (MEIS), nuclear reaction analysis (NRA), RBS, elastic backscattering spectrometry (EBS), SIMS, ellipsometry, gazing-incidence x-ray reflectometry (GIXRR), neutron reflectometry and transmission electron microscopy (TEM) were used for the measurements. Water and carbonaceous contamination about 1 nm were observed by ellipsometry and adsorbed oxygen mainly from water at thickness of 0.5 nm were seen by MEIS, NRA, RBS and GIXRR. The different uncertainty of the techniques for the scaling constant were also discussed