126 research outputs found
Immunostimulation by OX40 Ligand Transgenic Ewing Sarcoma Cells
Interleukin-2 (IL-2) transgenic Ewing sarcoma cells can induce tumor specific T and NK cell responses and reduce tumor growth in vivo and in vitro. Nevertheless, the efficiency of this stimulation is not high enough to inhibit tumor growth completely. In addition to recognition of the cognate antigen, optimal T cell stimulation requires signals from so-called co-stimulatory molecules. Several members of the tumor necrosis factor superfamily (TNFSF) have been identified as co-stimulatory molecules that can augment anti-tumor immune responses. OX40 (CD134) and OX40 ligand (OX40L = CD252; also known as tumor necrosis factor ligand family member 4) is one example for such receptor/ligand pair with co-stimulatory function. In the present investigation we generated OX40L transgenic Ewing sarcoma cells and tested their immuno-stimulatory activity in vitro. OX40L transgenic Ewing sarcoma cells showed preserved expression of Ewing sarcoma associated (anti)gens including lipase member I (LIPI), cyclin D1 (CCND1), cytochrome P450 family member 26B1 (CYP26B1) and the Ewing sarcoma breakpoint region 1-friend leukemia virus integration 1 (EWSR1-FLI1) oncogene. OX40L expressing tumor cells showed a trend for enhanced immune stimulation against Ewing sarcoma cells in combination with IL-2 and stimulation of CD137. Our data suggest that inclusion of the OX40/OX40L pathway of co-stimulation might improve immunotherapy strategies for treatment of Ewing sarcoma
Porous silicon formation and electropolishing
Electrochemical etching of silicon in hydrofluoride containing electrolytes
leads to pore formation for low and to electropolishing for high applied
current. The transition between pore formation and polishing is accompanied by
a change of the valence of the electrochemical dissolution reaction. The local
etching rate at the interface between the semiconductor and the electrolyte is
determined by the local current density. We model the transport of reactants
and reaction products and thus the current density in both, the semiconductor
and the electrolyte. Basic features of the chemical reaction at the interface
are summarized in law of mass action type boundary conditions for the transport
equations at the interface. We investigate the linear stability of a planar and
flat interface. Upon increasing the current density the stability flips either
through a change of the valence of the dissolution reaction or by a nonlinear
boundary conditions at the interface.Comment: 18 pages, 8 figure
Fostering accessible online education using Galaxy as an e-learning platform
The COVID-19 pandemic is shifting teaching to an online setting all over the world. The Galaxy framework facilitates the online learning process and makes it accessible by providing a library of high-quality community-curated training materials, enabling easy access to data and tools, and facilitates sharing achievements and progress between students and instructors. By combining Galaxy with robust communication channels, effective instruction can be designed inclusively, regardless of the students’ environments
Chemical composition of nanoporous layer formed by electrochemical etching of p-type GaAs
Abstract : We have performed a detailed characterization study of electrochemically etched p-type GaAs in a hydrofluoric acid-based electrolyte. The samples were investigated and characterized through cathodoluminescence (CL), X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). It was found that after electrochemical etching, the porous layer showed a major decrease in the CL intensity and a change in chemical composition and in the crystalline phase. Contrary to previous reports on p-GaAs porosification, which stated that the formed layer is composed of porous GaAs, we report evidence that the porous layer is in fact mainly constituted of porous As2O3. Finally, a qualitative model is proposed to explain the porous As2O3 layer formation on p-GaAs substrate
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